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NTB52N10

Onsemi

NTB52N10 by Onsemi

NTB52N10 by Onsemi is a N-CHANNEL Power FET with 100V DS Breakdown Voltage, ideal for SWITCHING applications. It features a Max Drain Current of 52A, 0.03 ohm Drain-Source On Resistance, and 178W Power Dissipation. This ENHANCEMENT MODE transistor in GULL WING package operates at up to 150 °C, making it suitable for high-power electronic devices.

Median Price

$0.510

Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 50 parts In-Stock

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$0.510

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$0.500

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$0.490

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$0.510

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$0.490

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Distributors (In-Stock)

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Digiode

USA . 1,155 parts In-Stock

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$0.545

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$0.545

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Chip Stock

USA . 31,000 parts In-Stock

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Vyrian

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Inventory MP

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Bristol Electronics

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Electronics Depot

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Corphita

USA . 292 parts In-Stock

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$0.517

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Corohmni

South Africa . 205 parts In-Stock

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$0.574

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Kepictronics

USA . 20,000 parts In-Stock

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SupplyDigital Components

Austria . 4,727 parts In-Stock

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TANS Electronics

Latvia . 4,591 parts In-Stock

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Kulean Microsystems

USA . 3,067 parts In-Stock

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Problanco Electronics

Mexico . 2,388 parts In-Stock

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Authorized Procurement Solutions

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UHIMA Technologies

Türkiye . 246 parts In-Stock

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Overview

Upgrade your power systems with the NTB52N10 from Onsemi, a leading manufacturer known for its high-quality Power Field Effect Transistors. This N-CHANNEL FET with a built-in diode is perfect for switching applications and offers a maximum drain current of 52A. With a small outline package and enhanced mode operation, this transistor delivers efficient performance and reliability. Trust Onsemi for cutting-edge technology and elevate your electronic designs with the NTB52N10.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material makes the packaging durable and resistant to external elements, ensuring the transistor's longevity.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are commonly used in power applications due to their low on-resistance and high efficiency, making this transistor a good choice for power switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and provides protection against voltage spikes, enhancing the reliability of the transistor in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor offers fast response times and efficient power handling capabilities, making it ideal for power control circuits.

Surface Mount: YES

The surface mount capability allows for easy and convenient PCB assembly, saving time and effort during production.

Maximum Drain-Source On Resistance: 0.03 ohm

With a low on-resistance, this transistor exhibits minimal power loss and high efficiency during operation, making it a suitable choice for power switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTB52N10 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

800 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

52 A

Maximum Drain Current (ID):

52 A

Maximum Drain-Source On Resistance:

.03 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

156 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB52N10 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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