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NTB52N10T4

Onsemi

NTB52N10T4 by Onsemi

NTB52N10T4 by Onsemi is a N-CHANNEL FET with 100V DS Breakdown Voltage, 52A Drain Current, and 0.03 ohm On Resistance. Ideal for SWITCHING applications due to its 156A Pulsed Drain Current and 178W Power Dissipation. It features ENHANCEMENT MODE operation and comes in a PLASTIC/EPOXY package with GULL WING terminals.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,653 parts In-Stock

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Vyrian

USA . 607 parts In-Stock

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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SupplyDigital Components

Austria . 6,330 parts In-Stock

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Problanco Electronics

Mexico . 5,577 parts In-Stock

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TANS Electronics

Latvia . 4,768 parts In-Stock

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Kulean Microsystems

USA . 3,724 parts In-Stock

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UHIMA Technologies

Türkiye . 768 parts In-Stock

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Corphita

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Corohmni

South Africa . 321 parts In-Stock

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Overview

Discover the power of efficient switching with the NTB52N10T4 by Onsemi. As a leading manufacturer of Power Field Effect Transistors, Onsemi delivers top-quality products that exceed expectations. This N-Channel transistor with built-in diode offers reliability and performance for various applications. With a high breakdown voltage of 100V and a maximum drain current of 52A, this transistor is designed for enhancement mode operation, making it an ideal choice for your projects. Experience the value and benefits of Onsemi's NTB52N10T4 for all your switching needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material for the package body makes the FET lightweight and durable, ideal for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are commonly used in switching applications due to their high efficiency and low resistance.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode simplifies circuit design and protection, making this FET a versatile option for various applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET offers fast switching speeds and low power consumption, making it suitable for a wide range of electronic devices.

Minimum DS Breakdown Voltage: 100 V

With a minimum breakdown voltage of 100V, this FET can handle high voltage applications safely and efficiently.

Package Shape: RECTANGULAR

The rectangular package shape allows for easy mounting and integration into circuit boards, simplifying the manufacturing process.

Maximum Pulsed Drain Current (IDM): 156 A

The high maximum pulsed drain current rating of 156A allows this FET to handle large current spikes and surge currents effectively.

Avalanche Energy Rating (EAS): 800 mJ

With a high avalanche energy rating, this FET can withstand energy spikes and provide reliable operation in harsh conditions.

Maximum Power Dissipation (Abs): 178 W

The high maximum power dissipation rating of 178W ensures that this FET can handle high power levels without overheating.

Maximum Drain-Source On Resistance: 0.03 ohm

The low on-resistance of 0.03 ohms results in minimal power loss and efficient operation, making this FET suitable for high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) NTB52N10T4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

800 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

52 A

Maximum Drain Current (ID):

52 A

Maximum Drain-Source On Resistance:

.03 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

156 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB52N10T4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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