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NTB45N06LT4G

Onsemi

NTB45N06LT4G by Onsemi

NTB45N06LT4G by Onsemi is a N-CHANNEL Power FET with 60V DS Breakdown Voltage and 45A Drain Current. Ideal for SWITCHING applications, it features a built-in DIODE, 0.028 ohm On Resistance, and operates in ENHANCEMENT MODE. Suitable for surface mount with GULL WING terminals, this transistor has a max power dissipation of 2.4W and can handle up to 150A pulsed drain current.

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Overview

Discover the power of innovation with Onsemi's NTB45N06LT4G Power Field Effect Transistor. Designed for high-performance switching applications, this N-channel transistor offers unparalleled reliability and efficiency. With a maximum drain current of 45A and a low on-resistance of just 0.028 ohms, this transistor delivers exceptional performance in a compact package. Whether you're looking to optimize power management in automotive systems or industrial controls, the NTB45N06LT4G is the ultimate solution for your application needs. Trust Onsemi for quality, value, and cutting-edge technology that sets you apart from the competition.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy packaging makes the transistor lightweight and durable, ensuring easy handling and robust performance.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer better electron mobility and faster switching speeds, making them suitable for high-frequency applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and protects against reverse currents, enhancing the overall efficiency and reliability of the transistor.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast switching speeds and low on-resistance, making it ideal for power management and control circuits.

Surface Mount: YES

Surface mount capability allows for easy integration onto PCBs, saving space and facilitating automated production processes.

Minimum DS Breakdown Voltage: 60 V

With a high breakdown voltage, this transistor can handle higher voltages without breakdown, making it suitable for a wide range of power applications.

Package Shape: RECTANGULAR

The rectangular package shape provides easy alignment and mounting on PCBs, ensuring a secure and reliable connection.

Terminal Form: GULL WING

The gull wing terminal form offers easy soldering and strong mechanical connection, ensuring stable performance under varying environmental conditions.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are easier to control and switch on/off, making them ideal for applications requiring precise and efficient power management.

Maximum Pulsed Drain Current (IDM): 150 A

With a high pulsed drain current rating, this FET can handle short-duration high current loads, making it suitable for high-power switching applications.

Avalanche Energy Rating (EAS): 240 mJ

The high avalanche energy rating indicates the FET's ability to withstand voltage spikes and transients, ensuring reliable operation in harsh conditions.

Maximum Drain Current (Abs) (ID): 45 A

The high drain current rating allows for handling of large continuous current loads, making it suitable for power amplification and switching applications.

No. of Terminals: 2

The two-terminal design simplifies circuit connections and reduces complexity, making it easy to integrate into various electronic systems.

Maximum Power Dissipation (Abs): 2.4 W

With a high power dissipation rating, this FET can handle significant power levels without overheating, ensuring long-term reliability and performance.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the PCB, allowing for compact and efficient circuit designs in space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers low on-resistance, high switching speeds, and low gate drive requirements, making it highly efficient for power switching applications.

Maximum Operating Temperature: 175 °C

The high operating temperature rating ensures reliable performance in high-temperature environments, making it suitable for a wide range of industrial applications.

Transistor Element Material: SILICON

Silicon-based transistors offer high thermal conductivity and stability, ensuring consistent performance over a wide temperature range and operating conditions.

Terminal Finish: MATTE TIN

The matte tin finish provides excellent solderability and corrosion resistance, ensuring a reliable electrical and mechanical connection for long-term use.

Maximum Drain-Source On Resistance: 0.028 ohm

The low on-resistance minimizes power losses and improves efficiency, making it an ideal choice for high-current and high-frequency applications.

Terminal Position: SINGLE

The single terminal position simplifies circuit connections and layout, reducing complexity and improving overall system reliability.

Case Connection: DRAIN

The drain connection simplifies circuit design and layout, providing a direct path for current flow and enhancing the efficiency of power delivery.

Maximum Time At Peak Reflow Temperature (s): 30

The short reflow time ensures quick and reliable solder joint formation during assembly, reducing production time and ensuring consistent quality.

Peak Reflow Temperature °C: 260

The high peak reflow temperature allows for efficient soldering and assembly processes, ensuring reliable and stable connections for optimal performance.

Technical Specifications

Power Field Effect Transistors (FET) NTB45N06LT4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

240 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

45 A

Maximum Drain Current (ID):

45 A

Maximum Drain-Source On Resistance:

.028 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

150 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB45N06LT4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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