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NTB45N06L

Onsemi

NTB45N06L by Onsemi

NTB45N06L by Onsemi is a N-CHANNEL Power FET with 60V DS Breakdown Voltage, 45A Drain Current, and 0.028 ohm On Resistance. Ideal for SWITCHING applications, it features a built-in diode and operates in ENHANCEMENT MODE. With a max power dissipation of 2.4W and peak reflow temperature of 235 °C, it is suitable for various high-power electronic designs.

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Digiode

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MISTER SPROCKETS

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TANS Electronics

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SupplyDigital Components

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Problanco Electronics

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Kulean Microsystems

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UHIMA Technologies

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Overview

Enhance your power management capabilities with the NTB45N06L by Onsemi. As a leading manufacturer in the industry, Onsemi guarantees top-quality products that deliver superior performance and reliability. This N-CHANNEL Power Field Effect Transistor (FET) is ideal for switching applications, offering a wide range of benefits including a high breakdown voltage, built-in diode, and low on-resistance. With a maximum drain current of 45A and a small outline package style, this transistor is perfect for various power electronics projects. Trust Onsemi to provide you with the cutting-edge technology you need to take your designs to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of PLASTIC/EPOXY material in the package body provides good insulation and protection for the internal components of the FET.

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs typically have better conductivity and lower ON resistance compared to P-CHANNEL FETs, making them more efficient for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode helps in protecting the circuit from voltage spikes and reverse currents, enhancing the overall reliability of the FET.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast switching speeds and low losses, making it ideal for high-performance systems.

Surface Mount: YES

Being surface mountable makes the FET easy to integrate onto circuit boards, saving space and simplifying the manufacturing process.

Minimum DS Breakdown Voltage: 60 V

With a minimum breakdown voltage of 60V, this FET can handle higher voltages, providing greater protection against overloads and surges.

Maximum Pulsed Drain Current (IDM): 150 A

The high maximum pulsed drain current rating allows the FET to handle sudden surges in current, making it suitable for high-power applications.

Maximum Drain-Source On Resistance: 0.028 ohm

The low ON resistance of 0.028 ohm ensures minimal power loss and heat generation, leading to improved efficiency in the circuit.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175 °C, this FET can withstand higher temperatures, making it suitable for industrial applications.

Technical Specifications

Power Field Effect Transistors (FET) NTB45N06L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

240 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

45 A

Maximum Drain Current (ID):

45 A

Maximum Drain-Source On Resistance:

.028 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

150 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB45N06L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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