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MCH6431-TL-W

Onsemi

MCH6431-TL-W by Onsemi

MCH6431-TL-W by Onsemi is a N-CHANNEL FET with 30V DS breakdown voltage, 20A IDM, and 0.055 ohm RDS(on). Ideal for power applications, it features a built-in diode, operates in enhancement mode, and has a max temp of 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Flip Electronics

USA . 18,000 parts In-Stock

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Vyrian

USA . 7,004 parts In-Stock

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Digiode

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AZTECH Wire

Italy . 1,121 parts In-Stock

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Kepictronics

USA . 306,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 24,449 parts In-Stock

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SupplyDigital Components

Austria . 7,829 parts In-Stock

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Problanco Electronics

Mexico . 5,003 parts In-Stock

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Kulean Microsystems

USA . 4,010 parts In-Stock

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TANS Electronics

Latvia . 2,372 parts In-Stock

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Corphita

USA . 353 parts In-Stock

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Corohmni

South Africa . 92 parts In-Stock

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UHIMA Technologies

Türkiye . 78 parts In-Stock

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Overview

Discover the power of the MCH6431-TL-W by Onsemi, a top-quality N-CHANNEL Power Field Effect Transistor with a built-in diode. Manufactured by Onsemi, this FET offers reliability and efficiency for a wide range of applications. From enhancing power management systems to optimizing circuit performance, this transistor delivers exceptional value and benefits to customers. Trust Onsemi for cutting-edge technology and superior products that drive innovation in the industry.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer better performance and lower resistance compared to P-channel FETs, making this product a good choice for high-efficiency applications.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle higher voltages, providing a wider range of applications for the product.

Maximum Drain Current (ID): 5 A

With a maximum drain current of 5A, this FET can handle high current loads, making it suitable for applications that require power switching.

Maximum Power Dissipation (Abs): 1.5 W

The maximum power dissipation of 1.5W ensures that the FET can operate efficiently without overheating, contributing to the reliability of the product.

Maximum Drains to Source On Resistance: 0.055 ohm

With a low on-resistance of 0.055 ohm, this FET minimizes power losses and improves efficiency in power switching applications.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature of 150 °C allows the FET to operate reliably in high-temperature environments, expanding the range of applications for the product.

Technical Specifications

Power Field Effect Transistors (FET) MCH6431-TL-W attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

ESD PROTECTED

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

5 A

Maximum Drain Current (ID):

5 A

Maximum Drain-Source On Resistance:

.055 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-F6

JESD-609 Code:

e6

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

20 A

Surface Mount:

YES

Terminal Finish:

TIN BISMUTH

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Trade Compliance

MCH6431-TL-W Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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