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ECH8601M

Onsemi

ECH8601M by Onsemi

ECH8601M by Onsemi is an N-CHANNEL Power FET with 8A max drain current and 1.6W max power dissipation. Ideal for applications requiring high efficiency in a surface mount package, operating at up to 150 °C.

Median Price

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Lifecycle Status

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2

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1k+

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Digiode

USA . 837 parts In-Stock

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Vyrian

USA . 677 parts In-Stock

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Kulean Microsystems

USA . 8,010 parts In-Stock

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TANS Electronics

Latvia . 4,195 parts In-Stock

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Corphita

USA . 2,354 parts In-Stock

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SupplyDigital Components

Austria . 1,144 parts In-Stock

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Corohmni

South Africa . 297 parts In-Stock

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Northwest PG Solutions

USA . 234 parts In-Stock

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Native Components

USA . 178 parts In-Stock

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UHIMA Technologies

Türkiye . 146 parts In-Stock

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Problanco Electronics

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Overview

Power up your electronics with the ECH8601M by Onsemi, a top-of-the-line N-CHANNEL Power Field Effect Transistor (FET) designed for enhanced performance and reliability. Manufactured by industry leader Onsemi, this FET offers unparalleled quality and precision. Whether you're looking to power up your automotive applications or industrial machinery, the ECH8601M provides the perfect solution. With a maximum drain current of 8 A and a maximum power dissipation of 1.6 W, this FET ensures optimal functionality even in the most demanding environments. Trust Onsemi to deliver exceptional value and performance with the ECH8601M.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for their high efficiency and fast switching speeds, making this product ideal for applications requiring quick response times.

Surface Mount: YES

Surface mount technology allows for easy and convenient installation, making this FET suitable for compact and densely populated PCB designs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control over the FET's switching characteristics, enabling precise modulation of power flow in various applications.

Maximum Drain Current (Abs): 8 A

With a high maximum drain current rating, this FET can handle heavy loads or high power applications efficiently without the risk of overheating or damage.

Maximum Power Dissipation (Abs): 1.6 W

The low power dissipation of 1.6W ensures that this FET operates efficiently and reliably while minimizing heat generation, contributing to the overall system's longevity.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high performance, low power consumption, and improved reliability, making this FET a suitable choice for demanding applications that require precision and stability.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature of 150 °C allows this FET to withstand elevated temperatures in harsh environments, ensuring dependable performance under challenging conditions.

Technical Specifications

Power Field Effect Transistors (FET) ECH8601M attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Maximum Drain Current (Abs) (ID):

8 A

Maximum Drain Current (ID):

8 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

ECH8601M Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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