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ECH8601M-C-TL-H

Onsemi

ECH8601M-C-TL-H by Onsemi

ECH8601M-C-TL-H by Onsemi is an N-CHANNEL Power FET with 8A max drain current and 1.6W power dissipation. Ideal for applications requiring high efficiency in a surface mount package, operating at up to 150 °C.

Median Price

$0.110

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

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DigiKey

USA . 6,000 parts In-Stock

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Flip Electronics (Authorized)

USA . 6,000 parts In-Stock

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Vyrian

USA . 1,052 parts In-Stock

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Chip Stock

USA . 47,000 parts In-Stock

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USA . 6,000 parts In-Stock

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Digiode

USA . 1,015 parts In-Stock

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Native Components

USA . 933 parts In-Stock

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$0.047

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$0.045

933

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Corohmni

South Africa . 142 parts In-Stock

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Authorized Procurement Solutions

USA . 25,000 parts In-Stock

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SupplyDigital Components

Austria . 7,858 parts In-Stock

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Kulean Microsystems

USA . 6,832 parts In-Stock

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TANS Electronics

Latvia . 4,468 parts In-Stock

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S.R.D Solutions

India . 3,000 parts In-Stock

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Northwest PG Solutions

USA . 1,846 parts In-Stock

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Corphita

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Kepictronics

USA . 960 parts In-Stock

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UHIMA Technologies

Türkiye . 849 parts In-Stock

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Problanco Electronics

Mexico . 376 parts In-Stock

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Overview

Power up your applications with the ECH8601M-C-TL-H by Onsemi! This N-CHANNEL Power Field Effect Transistor offers high-quality performance and reliability, making it a top choice for various power management needs. Whether you're designing power supplies, motor control systems, or LED lighting, this Enhancement Mode FET delivers exceptional efficiency and precision. Trust in Onsemi's expertise in semiconductor technology to bring you a product that exceeds expectations. Upgrade your designs today with the ECH8601M-C-TL-H and experience the difference in power and performance.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for their high efficiency and power handling capabilities, making them a popular choice for various electronic applications.

Surface Mount: YES

Surface mount FETs are easy to integrate onto circuit boards, reducing assembly time and making them suitable for compact designs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs require a positive voltage at the gate to turn on, providing better control and minimizing the risk of accidental activation.

Maximum Drain Current (Abs): 8 A

With a high maximum drain current, this FET can handle high power loads without overheating or failing, ensuring reliable performance.

Maximum Power Dissipation (Abs): 1.6 W

The low maximum power dissipation indicates that this FET is efficient and can operate at high power levels without excessive heat generation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor FETs are known for their high switching speeds and low power consumption, making them suitable for applications where efficiency is crucial.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can withstand harsh environmental conditions and operate reliably in a wide range of applications.

Terminal Finish: TIN BISMUTH

Tin bismuth terminal finish provides good solderability and resistance to corrosion, ensuring a reliable electrical connection and longevity of the FET.

Technical Specifications

Power Field Effect Transistors (FET) ECH8601M-C-TL-H attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Maximum Drain Current (Abs) (ID):

8 A

Maximum Drain Current (ID):

8 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e6

Moisture Sensitivity Level (MSL):

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN BISMUTH

Trade Compliance

ECH8601M-C-TL-H Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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