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ECH8602M

Onsemi

ECH8602M by Onsemi

ECH8602M by Onsemi is an N-CHANNEL Power FET with 6A max drain current and 1.5W max power dissipation. It operates in enhancement mode, suitable for applications requiring high power efficiency at up to 150 °C. Ideal for surface mount designs needing reliable metal-oxide semiconductor technology.

Median Price

-

Lifecycle Status

EOL

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 2,267 parts In-Stock

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Digiode

USA . 626 parts In-Stock

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626

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Distributors (Availability)

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Native Components

USA . 251 parts In-Stock

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$0.758

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251

$0.758

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Northwest PG Solutions

USA . 1,965 parts In-Stock

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$0.833

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$0.833

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Kulean Microsystems

USA . 7,807 parts In-Stock

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7,807

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TANS Electronics

Latvia . 7,671 parts In-Stock

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SupplyDigital Components

Austria . 3,020 parts In-Stock

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3,020

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UHIMA Technologies

Türkiye . 755 parts In-Stock

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755

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Corohmni

South Africa . 337 parts In-Stock

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Corphita

USA . 173 parts In-Stock

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Problanco Electronics

Mexico . 18 parts In-Stock

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Overview

Enhance your power management systems with the ECH8602M by Onsemi. This N-CHANNEL Power Field Effect Transistor boasts high-quality METAL-OXIDE SEMICONDUCTOR technology, offering reliability and efficiency. Ideal for a variety of applications, this FET operates in ENHANCEMENT MODE to deliver a maximum Drain Current of 6A and Power Dissipation of 1.5W. Trust Onsemi's expertise in semiconductor manufacturing to bring value and performance to your projects. Elevate your designs with the ECH8602M's superior capabilities and unlock new possibilities in power control.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for their high efficiency and fast switching capabilities, making this product a good choice for applications requiring quick response times.

Surface Mount: YES

Surface mount FETs are easy to install and offer a compact design, making them suitable for space-constrained applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer better control over the electrical current flow, providing greater precision and efficiency in the circuit operation.

Maximum Drain Current (Abs): 6 A

With a high maximum drain current capacity of 6 A, this FET can handle heavy loads and provide reliable performance in power applications.

Maximum Power Dissipation (Abs): 1.5 W

The low maximum power dissipation of 1.5 W ensures minimal heat generation and energy loss, leading to improved efficiency and reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high switching speeds and low gate capacitance, making this FET suitable for high-frequency applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high temperature environments, ensuring consistent performance in challenging conditions.

Technical Specifications

Power Field Effect Transistors (FET) ECH8602M attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

ECH8602M Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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