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MRF6V12250HR3

NXP Semiconductors

MRF6V12250HR3 by NXP Semiconductors

NXP Semiconductors' MRF6V12250HR3 is an N-CHANNEL RF Power FET with a min DS Breakdown Voltage of 110 V. It operates in ENHANCEMENT MODE at the L BAND frequency, suitable for high-power applications. The package style is FLANGE MOUNT, making it ideal for surface mount configurations.

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4

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1k+

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Digiode

USA . 3,828 parts In-Stock

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Anansix

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Vyrian

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Nova Conductors

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Corohmni

South Africa . 246 parts In-Stock

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Aztec Data Supply Inc.

USA . 3,397 parts In-Stock

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AZTECH Wire

Italy . 677 parts In-Stock

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Ampacity Inc.

Singapore . 512 parts In-Stock

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One Stop Electronics

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UNI Independent Distributors

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Corphita

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Microchip USA

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Continental Prestige Electronics

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Aranea Global

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Argo Parts USA

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Overview

Experience unparalleled performance with the NXP Semiconductors MRF6V12250HR3 RF Power FET. Known for their superior quality and innovative technology, NXP Semiconductors delivers cutting-edge solutions for a wide range of applications in the L Band frequency band. This single-channel transistor offers enhanced mode operation and a minimum DS breakdown voltage of 110V, making it a reliable and efficient choice for your RF power needs. Trust NXP Semiconductors to provide you with the value, benefits, and advantages you need to stay ahead in today's competitive market.

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED

This material provides excellent thermal conductivity and high reliability, making it a durable choice for RF power applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs offer higher mobility of charge carriers, lower resistance, and faster switching speeds compared to P-channel FETs, making them ideal for high-frequency applications.

Configuration: SINGLE

Single configuration FETs simplify circuit design and offer better stability, making them a suitable choice for applications requiring consistent performance.

Surface Mount: YES

Surface mount FETs are easy to install, occupy less space, and have improved high-frequency performance due to reduced parasitics, making them ideal for compact RF power applications.

Minimum DS Breakdown Voltage: 110 V

This high breakdown voltage ensures reliable operation and protection against voltage spikes, making this FET suitable for high-power RF applications.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient heat dissipation and easy integration with other components, making it a practical choice for RF power amplifiers.

Terminal Form: FLAT

Flat terminals ensure a secure connection and minimize signal loss, making this FET suitable for high-frequency RF applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer low on-state resistance and high input impedance, providing better efficiency and control in RF power amplification circuits.

Highest Frequency Band: L BAND

L-band FETs are optimized for frequencies in the L-band range (1-2 GHz), making them ideal for applications such as satellite communication and radar systems.

No. of Terminals: 2

With only two terminals, this FET is easy to integrate into circuits and offers simplified control and monitoring, making it suitable for compact RF power applications.

Package Style (Meter): FLANGE MOUNT

Flange mount packages provide mechanical stability and easy mounting options, making this FET suitable for rugged RF power amplification systems.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers low input capacitance, high gain, and improved linearity, making this FET ideal for high-frequency RF power applications.

Transistor Element Material: SILICON

Silicon-based FETs offer high carrier mobility, low power consumption, and excellent thermal stability, making this FET a reliable choice for RF power amplifiers.

Terminal Position: DUAL

Dual terminal positions provide flexibility in circuit design and allow for easy connection to other components, making this FET suitable for complex RF power applications.

Case Connection: SOURCE

The source connection allows for easy grounding and ensures stable operation, making this FET suitable for high-power RF amplification systems.

Technical Specifications

RF Power Field Effect Transistors (FET) MRF6V12250HR3 attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

110 V

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

L BAND

JESD-30 Code:

R-CDFM-F2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Element Material:

SILICON

Trade Compliance

MRF6V12250HR3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.75

SB

8541.29.00.80

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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