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BLF6G15L-500H

NXP Semiconductors

BLF6G15L-500H by NXP Semiconductors

BLF6G15L-500H by NXP is an N-channel RF power FET designed for switching applications. It features a 100V min DS breakdown voltage, operates in the L band, and supports a max drain current of 45A. Ideal for high-frequency amplification in communication systems.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Vyrian

USA . 1,761 parts In-Stock

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Digiode

USA . 1,566 parts In-Stock

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Anansix

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One Stop Electronics

USA . 1,447 parts In-Stock

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Corphita

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UNI Independent Distributors

Spain . 2,592 parts In-Stock

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Northwest PG Solutions

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Native Components

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Kepictronics

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Overview

Elevate your RF applications with the BLF6G15L-500H from NXP Semiconductors, where superior quality meets unmatched reliability. Designed for efficient switching in demanding environments, this N-Channel FET offers robust performance and durability, thanks to NXP's renowned expertise in semiconductor innovation. Ideal for L-band operations, it empowers your designs with seamless integration and exceptional power handling—unlocking new possibilities for high-performance systems.

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

The durable ceramic and metal-sealed co-fired package ensures excellent thermal performance and reliability, making it suitable for demanding applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors generally provide better efficiency and higher performance in switching applications.

Configuration: COMMON SOURCE, 2 ELEMENTS

The common source configuration is ideal for amplification and provides high gain, making it versatile for various applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensures efficient control of electrical power with rapid switching times.

Surface Mount: YES

Surface mount capabilities allow for compact design and ease of integration into modern electronics.

Minimum DS Breakdown Voltage: 100 V

With a minimum breakdown voltage of 100V, this FET is suitable for high-voltage applications, providing added safety and reliability.

Package Shape: RECTANGULAR

The rectangular shape facilitates efficient heat dissipation and easier handling during assembly.

Terminal Form: FLAT

Flat terminals promote better connectivity and ease of soldering in circuit designs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for extended operation in off-state conditions, optimizing power usage and efficiency.

Highest Frequency Band: L BAND

Operating in the L band makes this FET suitable for RF applications, providing broad frequency capabilities.

No. of Elements: 2

Having two elements allows for increased functionality in a single package, reducing space and component count in designs.

No. of Terminals: 4

The four-terminal design supports flexible circuit connections while simplifying layout considerations in PCB design.

Package Style (Meter): FLANGE MOUNT

Flange mount style enhances mechanical stability and allows for secure mounting in various applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology contributes to low power consumption and high switching speed, ideal for modern electronic designs.

Transistor Element Material: SILICON

Silicon offers great thermal and electrical stability, ensuring reliable operation across various conditions.

Maximum Drain Current (ID): 45 A

A maximum drain current of 45A makes this FET well-suited for high-power applications, enhancing overall system performance.

Terminal Position: DUAL

Dual terminal positioning allows for flexible layout designs and better integration into existing circuitry.

Case Connection: SOURCE

A source connection ensures optimal performance in switching applications, aiding in circuit design efficiency.

Technical Specifications

RF Power Field Effect Transistors (FET) BLF6G15L-500H attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (ID):

45 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

L BAND

JESD-30 Code:

R-CDFM-F4

Moisture Sensitivity Level (MSL):

NOT APPLICABLE

No. of Elements:

2

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

BLF6G15L-500H Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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