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BF998WR-TAPE-7

NXP Semiconductors

BF998WR-TAPE-7 by NXP Semiconductors

BF998WR-TAPE-7 by NXP Semiconductors is an N-channel RF FET designed for amplifier applications. It features a 12V min DS breakdown voltage, operates in the ultra-high frequency band, and supports dual gate depletion mode. This compact surface mount transistor ensures reliable performance up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Anansix

USA . 2,423 parts In-Stock

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Digiode

USA . 1,665 parts In-Stock

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Vyrian

USA . 181 parts In-Stock

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Native Components

USA . 378 parts In-Stock

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$0.528

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378

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Northwest PG Solutions

USA . 2,049 parts In-Stock

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$0.581

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$0.581

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One Stop Electronics

USA . 1,171 parts In-Stock

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$24.050

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$24.050

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UNI Independent Distributors

Spain . 7,704 parts In-Stock

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Corphita

USA . 3,566 parts In-Stock

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Overview

Unlock unparalleled performance with the BF998WR-TAPE-7 from NXP Semiconductors, a trusted leader in innovation. This top-tier RF small signal FET is engineered for reliability and efficiency, excelling in amplifier applications across various industries. Its compact design and dual gate configuration ensure seamless integration into your projects, delivering superior signal amplification and resilience. Elevate your technology with NXP’s commitment to quality and enjoy the benefits of enhanced performance and durability!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy offers robustness and protection against environmental factors, ensuring reliability and durability in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically provide better performance in terms of switching speed and efficiency, making them suitable for high-speed applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides added protection against reverse voltage, enhancing the overall reliability of the device in circuits.

Transistor Application: AMPLIFIER

Designed for amplification, this FET is ideal for applications requiring signal boosting, making it a great choice for audio and RF designs.

Surface Mount: YES

Surface mount technology allows for compact design and easier integration into modern electronic devices, suitable for high-density PCB layouts.

Minimum DS Breakdown Voltage: 12 V

With a reasonable minimum breakdown voltage, this FET is less likely to fail under typical operating conditions, adding to its reliability.

Package Shape: RECTANGULAR

The rectangular package shape facilitates efficient PCB layout and space optimization in electronic designs.

Terminal Form: GULL WING

Gull wing terminals enhance soldering reliability and provide good mechanical support, ensuring stable connections on the PCB.

Operating Mode: DUAL GATE, DEPLETION MODE

The dual gate operation allows for better control over the device's performance, making it suitable for applications requiring fine tuning of signal conditions.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Capable of operating in the ultra high frequency band, this FET is perfect for RF applications, including communications and broadcasting.

No. of Terminals: 4

With four terminals, this FET offers versatile connection options, simplifying integration into various circuit designs.

Package Style (Meter): SMALL OUTLINE

The small outline package style allows for reduced overall dimensions in devices, crucial for portable electronic applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET energy-efficient and ideal for battery-operated devices.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature ensures that this FET can perform reliably in demanding environmental conditions.

Transistor Element Material: SILICON

Silicon is a well-known semiconductor material that provides good performance in terms of speed and thermal characteristics.

Maximum Drain Current (ID): 0.03 A

This specified maximum drain current ensures that the FET can handle typical load conditions while maintaining efficiency.

Terminal Position: DUAL

Dual terminal positions enhance connection flexibility, allowing easier integration into different circuit configurations.

Case Connection: SOURCE

Having the case connected to the source helps in thermal management, providing better stability during operation.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF998WR-TAPE-7 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Additional Features:

LOW NOISE

Case Connection:

SOURCE

Minimum DS Breakdown Voltage:

12 V

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, DEPLETION MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF998WR-TAPE-7 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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