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MTA18ASF2G72PZ-2G9E1

Micron Technology

MTA18ASF2G72PZ-2G9E1 by Micron Technology

Micron Technology's MTA18ASF2G72PZ-2G9E1 is a DDR4 DRAM MODULE with 2GX72 organization, operating at 1466 MHz. It features synchronous mode, self-refresh capability, and common I/O type. Ideal for applications requiring high-speed memory performance in servers or data centers.

Median Price

$228.930

Lifecycle Status

Suppliers In-Stock

9

In-Stock Inventory

1k+

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Mouser Electronics

USA . 3 parts In-Stock

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$228.930

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Amazon

USA . 131 parts In-Stock

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$29.980

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$29.980

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eBay

USA . 148 parts In-Stock

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$35.000

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Newegg

USA . 84 parts In-Stock

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$50.640

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directmacro.com

USA . 89 parts In-Stock

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$68.850

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Chip Stock

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Vyrian

USA . 8,719 parts In-Stock

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Digiode

USA . 2,339 parts In-Stock

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Nova Conductors

Japan . 53 parts In-Stock

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Aztec Data Supply Inc.

USA . 84 parts In-Stock

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$3.369

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Ampacity Inc.

Singapore . 200 parts In-Stock

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$15.000

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AZTECH Wire

Italy . 1,047 parts In-Stock

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$20.420

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Speed Components Ltd (Excess)

Israel . 29,462 parts In-Stock

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Aranea Global

USA . 1,000 parts In-Stock

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Kepictronics

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Corphita

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Authorized Procurement Solutions

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Overview

Unleash the power of cutting-edge technology with the Micron Technology MTA18ASF2G72PZ-2G9E1 DDR4 DRAM MODULE. Crafted by a renowned manufacturer, this high-quality memory module offers seamless performance and reliability for a wide range of applications. Elevate your computing experience with lightning-fast speeds and efficient multitasking capabilities. Trust in Micron's expertise to deliver premium products that push the boundaries of innovation. Upgrade your system today and experience the true value and benefits of superior memory technology.

Feature Benefit Bullets

Package Shape: RECTANGULAR

The rectangular shape allows for easy installation and compatibility with standard mounting systems.

Operating Mode: SYNCHRONOUS

Synchronous operation ensures data is transferred efficiently and accurately, improving overall system performance.

Self Refresh: YES

Self-refresh capability helps conserve power and extend the lifespan of the product.

Nominal Supply Voltage / Vsup (V): 1.2

Operates with a relatively low supply voltage, reducing power consumption and heat generation.

No. of Terminals: 288

A high number of terminals allow for more data to be transferred simultaneously, improving speed and efficiency.

Maximum Operating Temperature: 95 °C

Capable of operating at high temperatures without compromising performance, making it suitable for demanding applications.

Memory IC Type: DDR4 DRAM MODULE

Utilizes the latest DDR4 technology, offering faster data transfer speeds and improved overall system performance.

Technical Specifications

DRAM MTA18ASF2G72PZ-2G9E1 attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

SINGLE BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH; WD-MAX

Maximum Clock Frequency (fCLK):

1466 MHz

Input/Output Type:

COMMON

Interleaved Burst Length:

8

JESD-30 Code:

R-XDMA-N288

Length:

133.35 mm

Memory Density:

154618822656 bit

Memory IC Type:

Memory Width:

72

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

288

No. of Words:

2147483648 words

No. of Words Code:

2G

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

95 Cel

Minimum Operating Temperature:

0 Cel

Organization:

2GX72

Output Characteristics:

OPEN-DRAIN

Package Body Material:

UNSPECIFIED

Package Code:

Package Equivalence Code:

DIMM288,33

Package Shape:

Package Style (Meter):

MICROELECTRONIC ASSEMBLY

Maximum Seated Height:

31.4 mm

Self Refresh:

YES

Sequential Burst Length:

8

Maximum Standby Current:

.396 Amp

Maximum Supply Current:

3870 mA

Maximum Supply Voltage (Vsup):

1.26 V

Minimum Supply Voltage (Vsup):

1.14 V

Nominal Supply Voltage / Vsup (V):

1.2

Surface Mount:

NO

Technology:

CMOS

Temperature Grade:

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Width:

3.9 mm

Trade Compliance

MTA18ASF2G72PZ-2G9E1 Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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