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MT41K256M16LY-107:N

Micron Technology

MT41K256M16LY-107:N by Micron Technology

Micron Technology's MT41K256M16LY-107:N is a DDR3L DRAM with 256MX16 organization, operating at 1.35V. It features synchronous operation, self-refresh capability, and multi-bank page burst access mode. Ideal for applications requiring high memory density and fast data processing in devices like smartphones and tablets.

Median Price

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Lifecycle Status

Suppliers In-Stock

13

In-Stock Inventory

1k+

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Vyrian

USA . 4,638 parts In-Stock

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Digiode

USA . 2,441 parts In-Stock

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Flip Electronics

USA . 1,340 parts In-Stock

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HZD GmbH

Germany . 1,044 parts In-Stock

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PC Components Company LLC

USA . 500 parts In-Stock

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LWI Electronics Inc

India . 365 parts In-Stock

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Sea View Technologies

USA . 286 parts In-Stock

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Bristol Electronics

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Infinite Electronics LLP

India . 100 parts In-Stock

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Nova Conductors

Japan . 72 parts In-Stock

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Inventory MP

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Netsource Technology, Inc.

USA . 8 parts In-Stock

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Cyclops Electronics Ltd

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AZTECH Wire

Italy . 451 parts In-Stock

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Ampacity Inc.

Singapore . 1,499 parts In-Stock

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A-Z Elektronik GmbH

Germany . 12,434 parts In-Stock

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Perfect Parts

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Kepictronics

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Corphita

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Futuretech Components

Singapore . 799 parts In-Stock

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Bastille Electronics

Australia . 700 parts In-Stock

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Overview

Experience the power of cutting-edge technology with Micron Technology's MT41K256M16LY-107:N DDR3L DRAM. Crafted for superior performance and reliability, this memory module is perfect for a wide range of applications, from high-speed data processing to seamless multitasking. With a sleek rectangular design and advanced features like self-refreshing capability, this product offers unmatched value and benefits for customers seeking top-tier memory solutions. Upgrade your system today with Micron Technology's innovative MT41K256M16LY-107:N.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material is commonly used in electronic components as it is lightweight, durable, and cost-effective.

Operating Mode: SYNCHRONOUS

Synchronous operation ensures that data is transferred at a specific clock rate, allowing for precise timing and efficient communication within the system.

Nominal Supply Voltage / Vsup (V): 1.35

The low supply voltage of 1.35V helps in reducing power consumption and heat dissipation, making it energy-efficient.

Organization: 256MX16

The 256MX16 organization indicates that the DRAM has a large memory capacity of 256 megabits organized in 16-bit width, suitable for handling complex computations and large data sets.

Access Mode: MULTI BANK PAGE BURST

The multi-bank page burst access mode enhances the data access speed by allowing multiple memory banks to be accessed simultaneously, improving overall system performance.

Technology: CMOS

CMOS technology enables low power consumption, high speed, and reliability in data storage and retrieval, making it a suitable choice for modern computing applications.

Memory IC Type: DDR3L DRAM

The DDR3L DRAM type offers increased data transfer rates, improved power efficiency, and enhanced overall performance compared to previous generation DDR memory, making it a favorable choice for various computing tasks.

Technical Specifications

DRAM MT41K256M16LY-107:N attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

MULTI BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH

JESD-30 Code:

R-PBGA-B96

Length:

13.5 mm

Memory Density:

4294967296 bit

Memory IC Type:

Memory Width:

16

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

96

No. of Words:

268435456 words

No. of Words Code:

256M

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

85 Cel

Minimum Operating Temperature:

0 Cel

Organization:

256MX16

Package Body Material:

PLASTIC/EPOXY

Package Code:

Package Shape:

Package Style (Meter):

GRID ARRAY, THIN PROFILE, FINE PITCH

Peak Reflow Temperature (C):

260

Maximum Seated Height:

1.2 mm

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.45 V

Minimum Supply Voltage (Vsup):

1.283 V

Nominal Supply Voltage / Vsup (V):

1.35

Surface Mount:

YES

Technology:

CMOS

Temperature Grade:

Terminal Form:

BALL

Terminal Pitch:

.8 mm

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

30

Width:

7.5 mm

Trade Compliance

MT41K256M16LY-107:N Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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