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STP90N55F4

STMicroelectronics

STP90N55F4 by STMicroelectronics

STP90N55F4 from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 90 A, a breakdown voltage of 55 V, and operates at up to 175 °C. Ideal for high-efficiency power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

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Vyrian

USA . 7,712 parts In-Stock

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Digiode

USA . 4,881 parts In-Stock

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Anansix

USA . 1,169 parts In-Stock

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Bristol Electronics

USA . 596 parts In-Stock

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Dan-Mar Components

USA . 596 parts In-Stock

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IDEA Electronic Components Group

UK . 2,025 parts In-Stock

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$1.385

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$1.246

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MKK Technologies

India . 1,422 parts In-Stock

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$2.604

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DigiPath Technology Company

USA . 1,422 parts In-Stock

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AZTECH Wire

Italy . 817 parts In-Stock

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Kepictronics

USA . 10,065 parts In-Stock

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Perfect Parts

USA . 4,832 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,639 parts In-Stock

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Parana Technologies

USA . 1,888 parts In-Stock

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Corphita

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Overview

Unlock unparalleled performance with the STP90N55F4, an N-channel power FET from STMicroelectronics. Renowned for their innovation and reliability, STMicroelectronics ensures this transistor excels in switching applications, delivering superior efficiency and robust operation. With a remarkable breakdown voltage of 55V and impressive current handling, the STP90N55F4 is perfect for demanding environments. Elevate your projects with quality you can trust!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body enhances durability and reliability, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

As an N-channel FET, it offers better efficiency and higher current carrying capacity compared to P-channel types.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and provides additional protection against reverse voltages.

Transistor Application: SWITCHING

Optimized for switching applications, it enables high-speed operation, making it ideal for power management tasks.

Minimum DS Breakdown Voltage: 55 V

A minimum breakdown voltage of 55V ensures robustness in high-voltage applications, preventing failure.

Package Shape: RECTANGULAR

The rectangular shape allows for compact layouts in PCB designs, optimizing space utilization.

Terminal Form: THROUGH-HOLE

Through-hole mounting provides strong mechanical stability and ease of handling during assembly.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation improves efficiency, allowing the device to handle higher currents with lower power loss.

Maximum Pulsed Drain Current (IDM): 360 A

A pulsed drain current rating of 360 A allows the FET to handle high transient currents, suitable for demanding applications.

Avalanche Energy Rating (EAS): 290 mJ

A high avalanche energy rating provides peace of mind during voltage spikes, protecting the device from damage.

Maximum Drain Current (Abs) (ID): 90 A

With an absolute maximum drain current of 90 A, this FET supports high-load applications with consistent performance.

No. of Terminals: 3

The three-terminal design enhances connectivity for easy integration into electronic circuits.

Maximum Power Dissipation (Abs): 150 W

A high power dissipation capability of 150 W allows the device to operate efficiently under substantial load conditions.

Package Style (Meter): FLANGE MOUNT

Flange mount style offers additional stability and robustness, especially in high-vibration environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology ensures low power consumption and high switching speed, making it perfect for modern applications.

Maximum Operating Temperature: 175 °C

A maximum operating temperature of 175 °C allows for reliable performance in high-temperature environments.

Transistor Element Material: SILICON

Silicon as the element material provides excellent electrical properties, ensuring high performance and reliability.

Terminal Finish: MATTE TIN

The matte tin finish enhances solderability and ensures reliable electrical connections.

Maximum Drain Current (ID): 90 A

Reiterating the capability of 90 A for maximum current allows for versatility in various high-power applications.

Maximum Drain-Source On Resistance: 0.008 ohm

A very low on-resistance minimizes power loss and heat generation, improving overall energy efficiency.

Terminal Position: SINGLE

Having a single terminal position simplifies layout for device integration, enhancing design convenience.

Case Connection: DRAIN

Direct case connection to the drain allows for efficient thermal management and improved electrical performance.

Technical Specifications

Power Field Effect Transistors (FET) STP90N55F4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

ULTRA LOW-ON RESISTANCE

Avalanche Energy Rating (EAS):

290 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

55 V

Maximum Drain Current (Abs) (ID):

90 A

Maximum Drain Current (ID):

90 A

Maximum Drain-Source On Resistance:

.008 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

360 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP90N55F4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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