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STP95N04

STMicroelectronics

STP95N04 by STMicroelectronics

STP95N04 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 80 A, a breakdown voltage of 40 V, and operates at up to 175 °C. Ideal for high-power circuits with low on-resistance (0.0065 Ω).

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 3,963 parts In-Stock

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Anansix

USA . 1,355 parts In-Stock

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Digiode

USA . 427 parts In-Stock

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427

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Semtec, LLC

USA . 98 parts In-Stock

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98

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IDEA Electronic Components Group

UK . 584 parts In-Stock

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$1.803

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$1.623

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584

$1.803

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$1.623

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MKK Technologies

India . 1,544 parts In-Stock

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$3.391

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DigiPath Technology Company

USA . 1,544 parts In-Stock

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$3.391

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$3.391

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AZTECH Wire

Italy . 898 parts In-Stock

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$16.690

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898

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Kepictronics

USA . 13,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 6,060 parts In-Stock

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,077 parts In-Stock

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Parana Technologies

USA . 2,029 parts In-Stock

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$2.156

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Corphita

USA . 996 parts In-Stock

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Overview

Unlock the power of innovation with the STP95N04 from STMicroelectronics, the trusted name in cutting-edge semiconductor solutions. This N-channel Power FET is designed for efficiency and reliability, ideal for demanding applications like automotive and industrial switching. With superior thermal performance and an impressive current handling capability, it ensures robust operation and longevity, empowering your designs with unparalleled quality and performance. Elevate your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy provides good durability and resistance to environmental factors, enhancing reliability in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel MOSFETs generally offer lower on-resistance and higher efficiency, making them ideal for power switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for easier implementation in circuits, providing intrinsic protection and allowing for efficient switching operations.

Transistor Application: SWITCHING

Designed specifically for switching, this FET excels in applications requiring fast and efficient control of power.

Minimum DS Breakdown Voltage: 40 V

A breakdown voltage of 40 V is suitable for a wide range of applications, providing flexibility and safety margins for voltage conditions.

Package Shape: RECTANGULAR

A rectangular package shape facilitates space-efficient designs in PCBs, optimizing layout and functionality.

Terminal Form: THROUGH-HOLE

Through-hole terminals offer sturdy connections, making the FET easy to solder and providing enhanced durability in high-stress applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors typically provide better performance for most applications, requiring less gate voltage to turn 'ON'.

Maximum Pulsed Drain Current (IDM): 320 A

A high pulsed drain current capability allows for handling demanding power conditions and enables the device to operate efficiently under peak loads.

Avalanche Energy Rating (EAS): 400 mJ

A high avalanche energy rating indicates robustness against unexpected transient events, increasing the reliability of the device in various conditions.

Maximum Drain Current (Abs) (ID): 80 A

With an absolute maximum drain current of 80 A, this FET is well-suited for high-power applications, ensuring reliable operation under heavy loads.

No. of Terminals: 3

The three-terminal design simplifies the integration into circuits while providing all necessary connections for efficient operation.

Maximum Power Dissipation (Abs): 110 W

The ability to dissipate 110 W of power allows the FET to operate efficiently in high-performance applications without overheating.

Package Style (Meter): FLANGE MOUNT

Flange mount packages provide additional mechanical stability and ease of mounting on heatsinks, improving thermal management.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high input impedance and fast switching speeds, making this FET excellent for modern electronic designs.

Maximum Operating Temperature: 175 °C

Operating at temperatures up to 175 °C enables this FET to be used in a wide range of environments, enhancing its application versatility.

Transistor Element Material: SILICON

Silicon as a material provides a good balance of performance, availability, and cost-effectiveness, making it a popular choice for FETs.

Terminal Finish: Matte Tin (Sn)

Matte tin finishing enhances solderability and prevents oxidation, ensuring reliable connections in circuit applications.

Maximum Drain Current (ID): 80 A

With a maximum drain current rating of 80 A, this FET can handle significant loads, making it suitable for high-power tasks.

Maximum Drain-Source On Resistance: 0.0065 ohm

Having a low on-resistance of 0.0065 ohm minimizes power loss and increases efficiency during operation, especially important in power applications.

Terminal Position: SINGLE

A single terminal position simplifies layout design and makes it easier to integrate into various PCB configurations.

Case Connection: DRAIN

Direct connection to the drain allows for efficient current flow and effective heat dissipation.

Technical Specifications

Power Field Effect Transistors (FET) STP95N04 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

400 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0065 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

320 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP95N04 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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