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STD6NM60N-1

STMicroelectronics

STD6NM60N-1 by STMicroelectronics

STD6NM60N-1 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 600V breakdown voltage, 4.6A max drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 5,853 parts In-Stock

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5,853

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Digiode

USA . 4,554 parts In-Stock

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4,554

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Anansix

USA . 222 parts In-Stock

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222

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Bristol Electronics

USA . 75 parts In-Stock

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75

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IDEA Electronic Components Group

UK . 2,160 parts In-Stock

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$1.158

100+ parts

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$1.042

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2,160

$1.158

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$1.042

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MKK Technologies

India . 1,156 parts In-Stock

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$2.178

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1,156

$2.178

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DigiPath Technology Company

USA . 1,156 parts In-Stock

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$2.178

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1,156

$2.178

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AZTECH Wire

Italy . 84 parts In-Stock

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$15.540

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84

$15.540

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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Authorized Procurement Solutions

USA . 25,000 parts In-Stock

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25,000

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A-Z Elektronik GmbH

Germany . 7,482 parts In-Stock

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7,482

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Alle Elektronik GmbH

Germany . 4,866 parts In-Stock

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Corphita

USA . 4,028 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 2,160 parts In-Stock

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Parana Technologies

USA . 493 parts In-Stock

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$1.385

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$1.385

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Kepictronics

USA . 150 parts In-Stock

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Overview

Unlock the power of efficiency with the STD6NM60N-1 from STMicroelectronics, a leader in innovative semiconductor solutions. This robust N-channel FET excels in switching applications, delivering exceptional reliability and performance even in demanding environments. With built-in diode protection and a high breakdown voltage of 600V, it ensures your systems run smoothly and safely. Elevate your projects with ST's superior quality and commitment to excellence—your trusted partner in modern technology!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material ensures a lightweight and compact design, which is ideal for space-constrained applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer better performance and efficiency than their P-channel counterparts, making them suitable for high-speed applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The integrated diode provides additional protection against voltage spikes, enhancing reliability in various applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET allows for efficient power management, making it suitable for various electronic devices.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage ensures that this transistor can handle demanding applications, offering reliability in high-voltage environments.

Package Shape: RECTANGULAR

The rectangular package shape facilitates easier circuit board layout and assembly, improving overall product design efficiency.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical connection and ease of soldering, ensuring durability in assembled devices.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation enhances efficiency and performance, making this FET ideal for low-power applications.

Maximum Pulsed Drain Current (IDM): 18.4 A

A high maximum pulsed drain current allows the device to handle significant power surges, great for applications requiring high current handling.

Avalanche Energy Rating (EAS): 65 mJ

With a good avalanche energy rating, this FET can safely dissipate energy during transient events, contributing to system reliability.

Maximum Drain Current (Abs) (ID): 4.6 A

The maximum drain current capability of 4.6 A allows this FET to effectively support various application loads without overheating.

No. of Terminals: 3

A simple 3-terminal configuration provides ease of use while keeping the design compact and efficient.

Maximum Power Dissipation (Abs): 45 W

High power dissipation capability ensures efficient thermal management, making the FET suitable for demanding applications.

Package Style (Meter): IN-LINE

The in-line style facilitates easier integration into existing circuit designs, providing flexibility in assembly and layout.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high efficiency and faster switching speeds compared to bipolar transistors.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature provides robustness in challenging environments, suitable for industrial and automotive applications.

Transistor Element Material: SILICON

Silicon is a reliable semiconductor material choice, ensuring stability and performance in a variety of applications.

Terminal Finish: MATTE TIN

The matte tin finish provides good solderability and corrosion resistance, increasing reliability in connections.

Maximum Drain Current (ID): 4.6 A

Reiterating the capability to handle substantial current, ensuring performance consistency in typical usage scenarios.

Maximum Drain-Source On Resistance: 0.92 ohm

A low on-resistance value minimizes power loss during operation, enhancing overall efficiency and thermal performance.

Terminal Position: SINGLE

Single terminal position simplifies assembly and reduces the risk of incorrect connections during soldering.

Technical Specifications

Power Field Effect Transistors (FET) STD6NM60N-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

65 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

4.6 A

Maximum Drain Current (ID):

4.6 A

Maximum Drain-Source On Resistance:

.92 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

18.4 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD6NM60N-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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