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STD60NH03L-1

STMicroelectronics

STD60NH03L-1 by STMicroelectronics

STD60NH03L-1 by STMicroelectronics is an N-channel FET ideal for switching applications, featuring a max drain current of 60 A and a breakdown voltage of 30 V. It offers low on-resistance at 0.017 Ω and operates up to 175 °C. This versatile transistor ensures efficient power management in various electronic circuits.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,476 parts In-Stock

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4,476

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Digiode

USA . 1,097 parts In-Stock

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1,097

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Anansix

USA . 246 parts In-Stock

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246

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 2,115 parts In-Stock

1+ parts

$0.573

100+ parts

-

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$0.516

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2,115

$0.573

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$0.516

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MKK Technologies

India . 1,350 parts In-Stock

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$1.078

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1,350

$1.078

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DigiPath Technology Company

USA . 1,350 parts In-Stock

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$1.078

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1,350

$1.078

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QUARKTWIN TECHNOLOGY LTD

USA . 5,875 parts In-Stock

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5,875

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Corphita

USA . 4,717 parts In-Stock

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4,717

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Alle Elektronik GmbH

Germany . 3,958 parts In-Stock

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3,958

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Parana Technologies

USA . 496 parts In-Stock

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$0.685

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496

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$0.685

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Overview

Unleash the power of innovation with the STD60NH03L-1 from STMicroelectronics, a leading name in semiconductor technology. This cutting-edge N-channel Power FET delivers unmatched efficiency and reliability for all your switching applications. With robust performance capabilities, including high current handling and thermal resilience, it’s perfect for demanding environments. Trust in STMicroelectronics’ legacy of quality to elevate your designs and drive exceptional value in your projects!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material provides durability and resistance to environmental factors, making the product reliable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are generally favored for their higher efficiency and better performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode enhances versatility and protects against flyback voltages in inductive loads.

Transistor Application: SWITCHING

Designed primarily for switching applications, this transistor ensures fast operation and efficiency in circuits.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30 V allows for applications in moderate voltage environments without risk of failure.

Package Shape: RECTANGULAR

The rectangular package shape facilitates easier PCB layout and provides efficient space utilization.

Terminal Form: THROUGH-HOLE

Through-hole terminals ensure strong mechanical connections and stability in applications requiring durability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control and efficiency, particularly in high-frequency applications.

Maximum Pulsed Drain Current (IDM): 240 A

A high pulsed drain current capability of 240 A makes this FET suitable for handling demanding power requirements.

Avalanche Energy Rating (EAS): 300 mJ

The avalanche energy rating allows the FET to withstand energy transients, improving reliability in harsh conditions.

Maximum Drain Current (Abs) (ID): 60 A

A maximum drain current rating of 60 A is ideal for heavy-load applications, ensuring consistent performance.

No. of Terminals: 3

With 3 terminals, this FET is easy to integrate into various circuit designs while providing necessary connectivity.

Maximum Power Dissipation (Abs): 70 W

A maximum power dissipation of 70 W allows for significant thermal management, making it suitable for high-power applications.

Package Style (Meter): IN-LINE

The in-line package style offers ease of installation and efficient space management in circuit designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizing MOS technology ensures low power consumption and high speed, making it a modern choice for power applications.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C enhances the product’s reliability in extreme environments.

Transistor Element Material: SILICON

Silicon materials offer excellent thermal stability and performance, making this FET suitable for a range of applications.

Maximum Drain Current (ID): 60 A

Reiterating the 60 A maximum drain current, this ensures robust performance across various load conditions.

Maximum Drain-Source On Resistance: 0.017 ohm

A low on-resistance value minimizes power loss and heat generation, enhancing efficiency during operation.

Terminal Position: SINGLE

A single terminal position simplifies connections in a circuit, reducing complexity in design.

Case Connection: DRAIN

Direct connection to the drain facilitates effective current flow and efficient operation in power applications.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C indicates compatibility with standard soldering processes for easy integration.

Technical Specifications

Power Field Effect Transistors (FET) STD60NH03L-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Avalanche Energy Rating (EAS):

300 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.017 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD60NH03L-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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