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STD60NH03LT4TRL

STMicroelectronics

STD60NH03LT4TRL by STMicroelectronics

STD60NH03LT4TRL by STMicroelectronics is a high-performance N-channel FET designed for efficient switching applications. It features a max drain current of 60 A, a breakdown voltage of 30 V, and low on-resistance of 0.017 Ω. Ideal for power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 1,666 parts In-Stock

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1,666

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Digiode

USA . 1,188 parts In-Stock

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1,188

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Anansix

USA . 909 parts In-Stock

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909

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 671 parts In-Stock

1+ parts

$1.763

100+ parts

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1k+ parts

$1.586

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671

$1.763

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$1.586

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MKK Technologies

India . 472 parts In-Stock

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$3.315

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472

$3.315

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DigiPath Technology Company

USA . 472 parts In-Stock

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$3.315

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472

$3.315

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Corphita

USA . 1,844 parts In-Stock

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1,844

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Parana Technologies

USA . 568 parts In-Stock

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$2.108

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568

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$2.108

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Overview

Elevate your designs with the STD60NH03LT4TRL from STMicroelectronics, a leader in semiconductor innovation. This high-performance N-channel FET is perfect for switching applications, delivering exceptional efficiency and reliability. With its compact size and robust features, it ensures seamless integration into various electronic systems, offering outstanding value and performance. Trust STMicroelectronics for quality that empowers your projects to thrive!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of a plastic/epoxy body material provides durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency, making them preferable for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode improves protection and enhances the switching performance of the transistor, reducing the need for external components.

Transistor Application: SWITCHING

Designed explicitly for switching applications, this FET excels in fast switching speeds, essential for modern electronic circuits.

Surface Mount: YES

Surface mount capability allows for compact designs, facilitating higher density circuit layouts and improved thermal performance.

Minimum DS Breakdown Voltage: 30 V

A breakdown voltage of 30 V ensures reliability in various applications while also handling minor voltage spikes effectively.

Package Shape: RECTANGULAR

The rectangular shape is optimized for efficient use of board space, enabling better layout flexibility in designs.

Terminal Form: GULL WING

Gull wing leads offer excellent soldering characteristics, improving the reliability of connections on the PCB.

Operating Mode: ENHANCEMENT MODE

Enhancement mode ensures that the transistor operates efficiently with higher gain, making it suitable for a broader range of applications.

Maximum Pulsed Drain Current (IDM): 240 A

A high pulsed drain current rating allows the FET to handle large temporary loads without failure, making it ideal for dynamic applications.

Avalanche Energy Rating (EAS): 300 mJ

A significant avalanche energy rating provides assurance that the FET can withstand transient conditions, increasing its reliability.

No. of Terminals: 2

Two terminals simplify the circuit design, making it easier to implement in various applications while reducing component count.

Package Style (Meter): SMALL OUTLINE

The small outline package is space-efficient, facilitating the design of compact and lightweight electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high input impedance and low power consumption, making this FET suitable for battery-powered devices.

Transistor Element Material: SILICON

Silicon is a well-established material for FETs, providing excellent performance and reliability in electronic applications.

Maximum Drain Current (ID): 60 A

A maximum drain current rating of 60 A supports high power applications, ensuring robustness in demanding environments.

Maximum Drain-Source On Resistance: 0.017 ohm

Low on-resistance minimizes power losses and improves efficiency, making this FET a great choice for power-sensitive applications.

Terminal Position: SINGLE

Single terminal positioning streamlines the design process and simplifies PCB layout, which can help reduce manufacturing costs.

Case Connection: DRAIN

Having the drain connection in the case leads to efficient heat dissipation and enhances the overall thermal management of the device.

Technical Specifications

Power Field Effect Transistors (FET) STD60NH03LT4TRL attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

300 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.017 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD60NH03LT4TRL Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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