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STB90N55F4

STMicroelectronics

STB90N55F4 by STMicroelectronics

STB90N55F4 from STMicroelectronics is a powerful N-channel FET designed for efficient switching applications. It features a max drain current of 90 A, breakdown voltage of 55 V, and operates at up to 175 °C. Ideal for high-performance power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 597 parts In-Stock

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Digiode

USA . 565 parts In-Stock

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565

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Anansix

USA . 314 parts In-Stock

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314

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,342 parts In-Stock

1+ parts

$0.932

100+ parts

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$0.839

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1,342

$0.932

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$0.839

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MKK Technologies

India . 1,816 parts In-Stock

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$1.752

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$1.752

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DigiPath Technology Company

USA . 1,816 parts In-Stock

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$1.752

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1,816

$1.752

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Corphita

USA . 2,473 parts In-Stock

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2,473

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Parana Technologies

USA . 1,591 parts In-Stock

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$1.114

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1,591

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$1.114

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Overview

Unlock superior performance with the STB90N55F4 from STMicroelectronics, a leader in innovative semiconductor solutions. This power FET combines unmatched quality and reliability, ideal for high-efficiency switching applications. With its robust design, it excels in demanding environments while delivering exceptional current handling and minimal energy loss. Elevate your projects with proven technology that ensures longevity, efficiency, and seamless integration into your designs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy provides durability and protection against environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient and offer greater switching speeds, making this product a good choice for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances the device's protection and reliability in switching applications, reducing the need for additional components.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET ensures efficient operation in power management tasks.

Surface Mount: YES

Surface mount technology allows for smaller footprints and automated assembly, significantly reducing manufacturing costs and improving performance in compact designs.

Minimum DS Breakdown Voltage: 55 V

A minimum breakdown voltage of 55V ensures the FET can operate safely in higher voltage environments, enhancing its versatility.

Package Shape: RECTANGULAR

The rectangular form factor optimizes space efficiency and is easily stackable in compact electronic designs.

Terminal Form: GULL WING

Gull wing terminals facilitate easier soldering and enhance mechanical stability, improving the reliability of the connection.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for excellent switching speed and lower power consumption, ideal for modern energy-efficient applications.

Maximum Pulsed Drain Current (IDM): 360 A

With a pulsed drain current capability of 360A, this FET can handle high surge currents, making it suitable for demanding applications.

Maximum Drain Current (Abs) (ID): 90 A

A maximum continuous drain current of 90A provides sufficient power handling for various industrial and consumer applications.

No. of Terminals: 2

Having only two terminals simplifies design and integration into circuits, making it easier for engineers to implement.

Maximum Power Dissipation (Abs): 150 W

A power dissipation rating of 150W allows for efficient thermal management in high-power applications, helping to prevent overheating.

Package Style (Meter): SMALL OUTLINE

The small outline package style is ideal for space-constrained designs, allowing for more compact circuit layouts.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizing metal-oxide semiconductor technology ensures high input impedance and excellent switching characteristics, benefiting performance.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C increases reliability in extreme environments, making it suitable for industrial applications.

Transistor Element Material: SILICON

Silicon as a transistor element material provides good thermal stability and a well-established technology base, contributing to the product's reliability.

Maximum Drain Current (ID): 90 A

The maximum drain current rating of 90A ensures reliable performance in various load conditions without compromising quality.

Maximum Drain-Source On Resistance: 0.008 ohm

A low on-resistance value of 0.008 ohm minimizes power loss during operation, enhancing the efficiency of the circuit.

Terminal Position: SINGLE

Single terminal positioning simplifies layout and design, facilitating easier manufacturing and assembly processes.

Technical Specifications

Power Field Effect Transistors (FET) STB90N55F4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Minimum DS Breakdown Voltage:

55 V

Maximum Drain Current (Abs) (ID):

90 A

Maximum Drain Current (ID):

90 A

Maximum Drain-Source On Resistance:

.008 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

360 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB90N55F4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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