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STB9NB50-1

STMicroelectronics

STB9NB50-1 by STMicroelectronics

STB9NB50-1 by STMicroelectronics is a N-CHANNEL FET with 500V DS Breakdown Voltage, 34.4A IDM, and 0.85 ohm RDS(on). It is used for SWITCHING applications due to its ENHANCEMENT MODE operation and 520mJ EAS rating.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,586 parts In-Stock

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4,586

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Digiode

USA . 2,824 parts In-Stock

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2,824

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Anansix

USA . 1,986 parts In-Stock

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1,986

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,947 parts In-Stock

1+ parts

$0.492

100+ parts

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$0.443

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1,947

$0.492

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$0.443

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MKK Technologies

India . 1,491 parts In-Stock

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$0.926

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1,491

$0.926

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DigiPath Technology Company

USA . 1,491 parts In-Stock

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$0.926

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1,491

$0.926

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Parana Technologies

USA . 2,004 parts In-Stock

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$0.588

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2,004

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$0.588

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Corphita

USA . 978 parts In-Stock

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978

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Overview

Unlock the power of innovation with the STB9NB50-1 by STMicroelectronics. As a leader in Power Field Effect Transistors (FET), STMicroelectronics guarantees top-notch quality and performance. This N-CHANNEL transistor, with its built-in diode, is perfect for switching applications, offering a minimum DS Breakdown Voltage of 500V. Experience enhanced efficiency and reliability with a maximum Pulsed Drain Current of 34.4A and an Avalanche Energy Rating of 520mJ. Trust STMicroelectronics to deliver cutting-edge technology that meets your needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

Allows for efficient current flow in the specified direction, enhancing performance and reliability.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design and improves efficiency with the built-in diode.

Minimum DS Breakdown Voltage: 500 V

Ensures the transistor can handle high voltages safely, making it versatile and reliable for different applications.

Package Shape: RECTANGULAR

Offers a compact design that helps in saving space in electronic circuits.

Terminal Form: THROUGH-HOLE

Facilitates easy and secure mounting on PCBs for convenient installation.

Operating Mode: ENHANCEMENT MODE

Enhances control over the transistor's conductivity, allowing for precise switching operations.

Maximum Pulsed Drain Current (IDM): 34.4 A

Capable of handling high current pulses, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 520 mJ

Provides protection against avalanche breakdown, ensuring the transistor's durability under extreme conditions.

No. of Terminals: 3

Simplifies circuit connections and reduces complexity in wiring setups.

Package Style (Meter): IN-LINE

Offers a convenient form factor for installation and compatibility with standard PCB layouts.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Provides efficient operation with low power consumption and high switching speeds.

Transistor Element Material: SILICON

Ensures reliability and stability of the transistor's performance over a wide temperature range.

Maximum Drain Current (ID): 8.6 A

Can handle high continuous currents, making it suitable for power switching applications.

Maximum Drain-Source On Resistance: 0.85 ohm

Offers low resistance for efficient power flow and reduced heat generation during operation.

Terminal Position: SINGLE

Simplifies circuit layout and connections for ease of use and installation.

Technical Specifications

Power Field Effect Transistors (FET) STB9NB50-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

520 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (ID):

8.6 A

Maximum Drain-Source On Resistance:

.85 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

34.4 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB9NB50-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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