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STB9NC60-1

STMicroelectronics

STB9NC60-1 by STMicroelectronics

STB9NC60-1 from STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 600V breakdown voltage, 36A pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

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Digiode

USA . 3,967 parts In-Stock

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Vyrian

USA . 3,139 parts In-Stock

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Anansix

USA . 456 parts In-Stock

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456

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Elcom Components

USA . 248 parts In-Stock

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IDEA Electronic Components Group

UK . 2,120 parts In-Stock

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$1.691

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$1.522

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$1.691

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$1.522

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MKK Technologies

India . 2,274 parts In-Stock

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$3.180

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DigiPath Technology Company

USA . 2,274 parts In-Stock

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Corphita

USA . 1,116 parts In-Stock

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Parana Technologies

USA . 83 parts In-Stock

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$2.022

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Perfect Parts

USA . 46 parts In-Stock

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Overview

Elevate your projects with the STB9NC60-1 power FET from STMicroelectronics, a trusted leader in semiconductor innovation. Designed for efficient switching applications, this robust N-channel transistor ensures reliability and superior performance under demanding conditions. Experience enhanced energy efficiency and longevity that translates to cost savings in your designs. Unlock unparalleled potential for industrial automation, renewable energy systems, and more—partner with STMicroelectronics for excellence!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy construction provides durability and protection against environmental factors, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are typically more efficient and have lower on-resistance, making them a preferred choice for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode allows for improved circuit design and integration, enhancing the device's versatility in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently control power in a reliable manner, making it ideal for power electronics.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage allows this FET to be used in high-voltage applications, providing reliability in demanding conditions.

Package Shape: RECTANGULAR

The rectangular shape facilitates easy mounting and integration into various circuit designs, optimizing space and layout efficiency.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical strength and are suitable for high-power applications, ensuring reliable connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for greater control and efficiency in switching, making it ideal for modern electronic applications.

Maximum Pulsed Drain Current (IDM): 36 A

A high pulsed drain current rating means this FET can handle significant transient loads, enhancing its performance in tough conditions.

Avalanche Energy Rating (EAS): 850 mJ

The high avalanche energy rating indicates robustness and safety in high-energy environments, reducing the risk of failure in dynamic circuits.

Maximum Drain Current (Abs) (ID): 9 A

With a maximum drain current of 9 A, this FET can effectively manage substantial loads and power demands in various applications.

No. of Terminals: 3

The three-terminal configuration simplifies circuit design while providing essential functionality for various applications.

Maximum Power Dissipation (Abs): 125 W

A high power dissipation capability means this FET can handle greater thermal stresses, ensuring reliable operation in demanding environments.

Package Style (Meter): IN-LINE

In-line packaging allows for compact integration into circuitry, minimizing space usage while maximizing efficiency.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and efficiency, making this FET suitable for a wide range of applications in modern electronics.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature provides greater flexibility in thermal management, allowing for operation in harsher environments.

Transistor Element Material: SILICON

Silicon-based materials ensure good electrical characteristics and are widely accepted, providing reliability and availability.

Terminal Finish: TIN

Tin plating enhances solderability and corrosion resistance, ensuring secure connections and long-term reliability.

Maximum Drain Current (ID): 9 A

This repeats, emphasizing strong current handling capability, making the FET suitable for a variety of applications requiring reliable performance.

Maximum Drain-Source On Resistance: 0.75 ohm

Low on-resistance translates to reduced power losses during operation, enhancing efficiency and performance in power applications.

Terminal Position: SINGLE

A single terminal position simplifies layout and design, allowing for more straightforward integration into various circuits.

Case Connection: DRAIN

DRAIN connection helps in the efficient flow of current, vital for optimizing performance in power switching applications.

Technical Specifications

Power Field Effect Transistors (FET) STB9NC60-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

850 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

9 A

Maximum Drain Current (ID):

9 A

Maximum Drain-Source On Resistance:

.75 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

36 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB9NC60-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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