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STB70NH03LT4

STMicroelectronics

STB70NH03LT4 by STMicroelectronics

STB70NH03LT4 from STMicroelectronics is a high-performance N-channel MOSFET designed for efficient switching applications. It features a max drain current of 60 A, a breakdown voltage of 30 V, and operates at up to 175 °C. Ideal for power management in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 7,584 parts In-Stock

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7,584

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Digiode

USA . 3,651 parts In-Stock

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3,651

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Anansix

USA . 1,452 parts In-Stock

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1,452

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QIE Inc.

USA . 94 parts In-Stock

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94

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IDEA Electronic Components Group

UK . 1,252 parts In-Stock

1+ parts

$1.374

100+ parts

-

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$1.237

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1,252

$1.374

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$1.237

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Advanced Electronics

New Zealand . 800 parts In-Stock

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$1.638

100+ parts

$1.622

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$1.556

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800

$1.638

$1.622

$1.556

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MKK Technologies

India . 1,823 parts In-Stock

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$2.585

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1,823

$2.585

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DigiPath Technology Company

USA . 1,823 parts In-Stock

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$2.585

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1,823

$2.585

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AZTECH Wire

Italy . 95 parts In-Stock

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$17.350

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95

$17.350

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Alle Elektronik GmbH

Germany . 3,485 parts In-Stock

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3,485

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Parana Technologies

USA . 527 parts In-Stock

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$1.643

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527

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$1.643

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Corphita

USA . 212 parts In-Stock

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Overview

Unlock unparalleled performance with the STB70NH03LT4 from STMicroelectronics, a leader in innovative semiconductor solutions. This high-quality N-channel power FET is designed for reliable switching applications, delivering exceptional efficiency and thermal management. With a compact footprint, it seamlessly fits into diverse electronic designs, enhancing functionality while reducing energy consumption. Choose STMicroelectronics for superior reliability and cutting-edge technology that empowers your projects to excel.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material offers durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer better performance and efficiency for switching applications compared to P-channel devices.

Configuration: SINGLE WITH BUILT-IN DIODE

The integrated diode provides enhanced protection against flyback and allows for faster switching, benefiting various circuit designs.

Transistor Application: SWITCHING

Optimized for switching applications ensures rapid on-off operation, ideal for power management and control circuits.

Surface Mount: YES

Surface mount technology facilitates compact designs and efficient manufacturing processes, making it suitable for modern electronic devices.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30V provides reliable operation in various voltage environments, enhancing circuit safety.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient space utilization on PCBs, making it easier to design compact circuits.

Terminal Form: GULL WING

Gull wing terminals provide ease of handling during assembly and improve soldering reliability, ensuring strong connections in circuits.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation enables greater control over device performance, facilitating efficient power management solutions.

Maximum Pulsed Drain Current (IDM): 240 A

A high maximum pulsed drain current rating allows for the handling of large transient loads, making it suitable for high-power applications.

Avalanche Energy Rating (EAS): 300 mJ

The ability to handle 300 mJ of avalanche energy indicates robust protection against voltage transients, ideal for demanding environments.

Maximum Drain Current (Abs) (ID): 60 A

A maximum drain current of 60A supports high current applications, ensuring reliable operation in power electronics.

No. of Terminals: 2

With only 2 terminals, this FET simplifies circuit design, reducing the footprint and necessary connections.

Maximum Power Dissipation (Abs): 85 W

An 85W maximum power dissipation rating allows for efficient heat management, critical in high-performance applications.

Package Style (Meter): SMALL OUTLINE

The small outline package supports space-constrained designs, making it a great choice for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology supports high-speed operation and low power consumption, making it efficient for a wide range of applications.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature allows for reliable performance in demanding environments, extending product life.

Transistor Element Material: SILICON

Silicon offers excellent thermal and electrical properties, ensuring stable operation and performance across various applications.

Terminal Finish: MATTE TIN

Matte tin finish provides good solderability, ensuring solid connections and enhancing the reliability of the product.

Maximum Drain Current (ID): 60 A

Reiterating a maximum drain current of 60A emphasizes the power handling capability, making it suitable for robust applications.

Maximum Drain-Source On Resistance: 0.017 ohm

A low on-resistance allows for efficient current flow and minimized power loss, enhancing overall circuit efficiency.

Terminal Position: SINGLE

Single terminal position simplifies design, making layout and connections easier for developers.

Case Connection: DRAIN

DRAIN case connection ensures optimal performance and ease of integration into various circuit configurations.

Technical Specifications

Power Field Effect Transistors (FET) STB70NH03LT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

300 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.017 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB70NH03LT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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