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STB70NFS03L

STMicroelectronics

STB70NFS03L by STMicroelectronics

STB70NFS03L from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 70 A, breakdown voltage of 30 V, and operates at up to 175 °C. Ideal for high-efficiency power management in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 3,459 parts In-Stock

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3,459

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Anansix

USA . 1,859 parts In-Stock

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1,859

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Digiode

USA . 292 parts In-Stock

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292

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PC Components Company LLC

USA . 51 parts In-Stock

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,546 parts In-Stock

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$1.064

100+ parts

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$0.957

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1,546

$1.064

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$0.957

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MKK Technologies

India . 1,297 parts In-Stock

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$2.000

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$2.000

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DigiPath Technology Company

USA . 1,297 parts In-Stock

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$2.000

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$2.000

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Corphita

USA . 489 parts In-Stock

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Parana Technologies

USA . 442 parts In-Stock

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$1.272

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442

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Overview

Unlock the potential of your designs with the STB70NFS03L from STMicroelectronics, a leader in innovative semiconductor solutions. This N-channel power FET delivers exceptional performance for switching applications, ensuring reliability and efficiency in demanding environments. Its compact surface-mount design and robust specifications make it ideal for automotive, industrial, and consumer electronics. Trust STMicroelectronics for quality that drives your success!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides a robust and lightweight structure, suitable for high-performance applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient and have better performance characteristics, making this product ideal for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances circuit protection and simplifies design by eliminating the need for external components.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET excels in efficient power transfer and minimal losses.

Surface Mount: YES

Surface mount capability allows for denser circuit designs, saving space on the PCB while enabling automated assembly.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30 V enables safe operation in a variety of environments, enhancing reliability.

Package Shape: RECTANGULAR

The rectangular shape optimizes space utilization on printed circuit boards, facilitating compact design.

Terminal Form: GULL WING

Gull wing terminals provide excellent soldering contact and improve mechanical strength in assembled devices.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low power consumption during standby, which is beneficial for battery-operated devices.

Maximum Pulsed Drain Current: 280 A

The high pulsed drain current rating facilitates handling of transient loads, making it suitable for demanding electronic applications.

Avalanche Energy Rating: 500 mJ

A 500 mJ avalanche energy rating indicates robustness against voltage spikes, enhancing reliability in harsh environments.

Maximum Drain Current (Abs): 70 A

With a maximum absolute drain current of 70 A, this device can handle substantial loads effectively without failure.

No. of Terminals: 2

The simple two-terminal design simplifies circuit integration and reduces the potential for connectivity issues.

Maximum Power Dissipation (Abs): 100 W

A maximum power dissipation of 100 W allows for effective thermal management in high-power applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style is excellent for space-constrained designs, facilitating compact product development.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures high input impedance and low power consumption, providing efficient circuit performance.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175 °C, this FET can perform reliably in high-temperature environments.

Transistor Element Material: SILICON

Silicon is a widely used semiconductor material offering excellent electrical characteristics and reliability.

Terminal Finish: MATTE TIN

Matte tin finish enhances solderability and corrosion resistance, improving the longevity of connections.

Maximum Drain Current (ID): 70 A

With a maximum drain current of 70 A, it ensures efficient power handling suitable for high-load applications.

Maximum Drain-Source On Resistance: 0.0095 ohm

The low on-resistance promotes efficient energy transfer with minimal heat generation, enhancing overall performance.

Terminal Position: SINGLE

The single terminal position simplifies layout and design for circuit boards, making assembly more straightforward.

Case Connection: DRAIN

Drain case connection ensures a straightforward integration into various configurations, enhancing performance consistency.

Technical Specifications

Power Field Effect Transistors (FET) STB70NFS03L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

500 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

70 A

Maximum Drain Current (ID):

70 A

Maximum Drain-Source On Resistance:

.0095 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

280 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB70NFS03L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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