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STB75N20T4

STMicroelectronics

STB75N20T4 by STMicroelectronics

STB75N20T4 from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 75 A, breakdown voltage of 200 V, and low on-resistance of 0.034 Ω. Ideal for high-efficiency power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,344 parts In-Stock

1+ parts

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4,344

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Digiode

USA . 3,011 parts In-Stock

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3,011

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Anansix

USA . 1,156 parts In-Stock

1+ parts

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1,156

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,585 parts In-Stock

1+ parts

$1.708

100+ parts

-

1k+ parts

$1.538

10k+ parts

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1,585

$1.708

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$1.538

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MKK Technologies

India . 1,831 parts In-Stock

1+ parts

$3.213

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1,831

$3.213

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DigiPath Technology Company

USA . 1,831 parts In-Stock

1+ parts

$3.213

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1,831

$3.213

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Parana Technologies

USA . 1,503 parts In-Stock

1+ parts

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$2.043

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1,503

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$2.043

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Corphita

USA . 503 parts In-Stock

1+ parts

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503

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Overview

Unlock unparalleled performance with the STB75N20T4 from STMicroelectronics, a trusted leader in innovation. This power FET is designed for seamless switching applications, offering reliability and efficiency that enhance your electronic designs. With its robust construction and advanced technology, you’ll experience superior thermal management and impressive current handling. Choose STMicroelectronics for quality you can trust—empowering your projects today and into the future!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and resilience in various environmental conditions, making it suitable for a range of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher speed, which enhances performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enables reverse polarity protection and improves circuit design efficiency by reducing component count.

Transistor Application: SWITCHING

Optimized for switching applications, this FET can effectively control high voltages and currents, making it ideal for power management.

Surface Mount: YES

Surface mount technology allows for smaller circuit designs and automated PCB assembly, making manufacturing more efficient.

Minimum DS Breakdown Voltage: 200 V

A breakdown voltage of 200 V ensures reliability in high-voltage applications, enhancing safety and performance.

Package Shape: RECTANGULAR

The rectangular shape is standard for efficient layout and better thermal management, fitting well into various circuit designs.

Terminal Form: GULL WING

Gull wing terminals provide better soldering reliability and ease of inspection during manufacturing.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption and efficient switching, suitable for modern electronic devices.

Maximum Pulsed Drain Current (IDM): 300 A

With a maximum pulsed drain current of 300 A, this FET can handle demanding applications requiring high current spikes.

Avalanche Energy Rating (EAS): 205 mJ

The high avalanche energy rating provides a safety margin against transient voltage spikes, ensuring reliability in fluctuating environments.

Maximum Drain Current (Abs) (ID): 75 A

A maximum drain current rating of 75 A makes this FET suitable for applications that require high load capabilities.

No. of Terminals: 2

The two-terminal design simplifies integration and minimizes footprint on the PCB, allowing for compact designs.

Maximum Power Dissipation (Abs): 190 W

A power dissipation capability of 190 W indicates strong performance, enabling the FET to handle significant power without failure.

Package Style (Meter): SMALL OUTLINE

The small outline package style allows for space-saving designs in modern electronics, making it ideal for compact applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and low power consumption, enhancing operational efficiency.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET is reliable in extreme conditions, ensuring longevity and stability.

Transistor Element Material: SILICON

Silicon is the standard material for FETs, providing excellent electrical properties and thermal stability.

Maximum Drain Current (ID): 75 A

Allowing for high current capabilities, this FET is suitable for power applications needing reliable performance.

Maximum Drain-Source On Resistance: 0.034 ohm

The low on-resistance minimizes energy losses during operation, increasing overall system efficiency.

Terminal Position: SINGLE

A single terminal position simplifies installation and integration into circuit boards, enhancing user convenience.

Technical Specifications

Power Field Effect Transistors (FET) STB75N20T4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

205 mJ

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (Abs) (ID):

75 A

Maximum Drain Current (ID):

75 A

Maximum Drain-Source On Resistance:

.034 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

300 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB75N20T4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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