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STB70N10F4

STMicroelectronics

STB70N10F4 by STMicroelectronics

STB70N10F4 from STMicroelectronics is a powerful N-channel FET designed for efficient switching applications. It features a max drain current of 65 A, a breakdown voltage of 100 V, and operates at up to 175 °C. Ideal for high-performance power management in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,407 parts In-Stock

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4,407

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Digiode

USA . 4,129 parts In-Stock

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4,129

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Anansix

USA . 2,365 parts In-Stock

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2,365

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 2,195 parts In-Stock

1+ parts

$1.530

100+ parts

-

1k+ parts

$1.377

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2,195

$1.530

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$1.377

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MKK Technologies

India . 1,983 parts In-Stock

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$2.877

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1,983

$2.877

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DigiPath Technology Company

USA . 1,983 parts In-Stock

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$2.877

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1,983

$2.877

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AZTECH Wire

Italy . 628 parts In-Stock

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$20.640

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628

$20.640

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 9,242 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,654 parts In-Stock

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Authorized Procurement Solutions

USA . 5,500 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,979 parts In-Stock

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4,979

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Corphita

USA . 3,126 parts In-Stock

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3,126

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Parana Technologies

USA . 1,495 parts In-Stock

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$1.829

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1,495

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$1.829

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Overview

Unlock the power of efficiency with the STB70N10F4 from STMicroelectronics, a leader in innovation and quality. Designed for robust switching applications, this N-channel FET delivers exceptional performance with minimal energy loss. Its compact surface-mount design makes it ideal for modern electronics, ensuring reliability even under demanding conditions. Experience superior durability and seamless integration, empowering your designs while maximizing value and performance.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This lightweight and durable package material ensures good thermal performance and protection against environmental factors.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency compared to P-channel devices, making them ideal for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional protection and allows for easy integration in various circuit designs, improving reliability.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET effectively manages and controls power, providing high-speed performance.

Surface Mount: YES

Surface mount capability allows for compact designs and easier automation in manufacturing processes.

Minimum DS Breakdown Voltage: 100 V

This high breakdown voltage ensures safe operation under various conditions, making it suitable for high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape is designed for optimal space utilization on printed circuit boards, allowing for efficient layouts.

Terminal Form: GULL WING

Gull wing terminals provide a stable and secure soldering surface which improves reliability in the assembly process.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower on-resistance at a given gate voltage, enhancing efficiency during operation.

Maximum Pulsed Drain Current (IDM): 260 A

With a high pulsed drain current capacity, this FET can handle transient load demands effectively, ensuring robust performance.

Avalanche Energy Rating (EAS): 120 mJ

A significant avalanche energy rating indicates that the FET can withstand high-energy events, adding an extra layer of protection and reliability.

Maximum Drain Current (Abs) (ID): 65 A

This high maximum drain current capability allows for versatile applications in demanding environments, enhancing product reliability.

No. of Terminals: 2

A 2-terminal configuration simplifies the design and implementation in various circuit topologies.

Maximum Power Dissipation (Abs): 150 W

High power dissipation capacity enables the FET to operate in high-power applications without overheating, ensuring longevity.

Package Style (Meter): SMALL OUTLINE

The small outline package facilitates compact designs and efficient use of PCB space, ideal for consumer electronics.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology is known for its high input impedance and low power consumption, making it suitable for battery-operated devices.

Maximum Operating Temperature: 175 °C

With a high maximum operating temperature, this FET is suitable for use in high-temperature environments, boosting its versatility.

Transistor Element Material: SILICON

Silicon is a well-established material in semiconductor technology, providing reliable performance in a variety of applications.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish provides excellent solderability and corrosion resistance, enhancing the longevity of the connections.

Maximum Drain Current (ID): 65 A

This robust drain current capability ensures that the FET can handle significant load currents effectively in power applications.

Maximum Drain-Source On Resistance: 0.0195 ohm

Low on-resistance reduces power loss during operation, increasing the efficiency of power applications.

Terminal Position: SINGLE

A single terminal position allows for simplified connections in circuit designs, contributing to ease of integration.

Maximum Time At Peak Reflow Temperature (s): 30

This specification ensures compatibility with standard soldering processes, making assembly easier and more reliable.

Peak Reflow Temperature °C: 245

A high peak reflow temperature guarantees compatibility with advanced PCB assembly processes, ensuring robust manufacturing.

Technical Specifications

Power Field Effect Transistors (FET) STB70N10F4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

120 mJ

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

65 A

Maximum Drain Current (ID):

65 A

Maximum Drain-Source On Resistance:

.0195 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

260 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB70N10F4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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