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STB75N15T4

STMicroelectronics

STB75N15T4 by STMicroelectronics

STB75N15T4 from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 75 A, breakdown voltage of 150 V, and low on-resistance of 0.023 Ω. Ideal for high-efficiency power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,890 parts In-Stock

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4,890

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Digiode

USA . 3,141 parts In-Stock

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3,141

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Anansix

USA . 2,423 parts In-Stock

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2,423

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 398 parts In-Stock

1+ parts

$1.238

100+ parts

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$1.114

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398

$1.238

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$1.114

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MKK Technologies

India . 789 parts In-Stock

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$2.329

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789

$2.329

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DigiPath Technology Company

USA . 789 parts In-Stock

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$2.329

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789

$2.329

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Corphita

USA . 4,573 parts In-Stock

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4,573

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Parana Technologies

USA . 406 parts In-Stock

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$1.481

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406

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$1.481

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Overview

Unlock unparalleled efficiency with the STB75N15T4 from STMicroelectronics, a leading innovator in semiconductor technology. This high-performance N-channel power FET is engineered for exceptional switching capabilities, ensuring reliable operation in demanding applications. With outstanding thermal performance and robust design, it provides significant energy savings and enhances system reliability. Elevate your projects with ST’s commitment to quality and innovation—where value meets performance.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy enhances durability and resistance to environmental factors, making it a reliable choice for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for lower on-resistance and higher efficiency, making them ideal for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides added protection against reverse voltages, enhancing the overall reliability of the device.

Transistor Application: SWITCHING

Optimized for switching applications, this FET is capable of handling fast switching speeds, making it suitable for digital circuits.

Surface Mount: YES

Surface mount technology allows for compact design, saving space on printed circuit boards while facilitating easier assembly.

Minimum DS Breakdown Voltage: 150 V

A high breakdown voltage ensures that this FET can withstand significant voltage levels, increasing its applicability in high-voltage circuits.

Package Shape: RECTANGULAR

The rectangular shape maximizes surface area for heat dissipation, enhancing performance in thermal management.

Terminal Form: GULL WING

Gull wing terminals provide excellent solder joint integrity, ensuring reliable electrical connections during operation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode provides superior control of the drain current, allowing for efficient operation in a wide range of applications.

Maximum Pulsed Drain Current (IDM): 300 A

A high pulsed drain current capability makes this FET suitable for applications requiring strong transient response.

Maximum Drain Current (Abs) (ID): 75 A

The ability to handle 75 A ensures robust performance in demanding applications without the risk of overheating.

No. of Terminals: 2

A two-terminal design simplifies integration into circuits, making it an efficient choice for designers.

Maximum Power Dissipation (Abs): 300 W

The high power dissipation capability allows this FET to manage substantial power loads, suitable for high-performance applications.

Package Style (Meter): SMALL OUTLINE

The small outline package aids in space-efficient designs, making it ideal for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making it efficient for a variety of applications.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C ensures reliability in high-temperature environments, making it suitable for rugged applications.

Transistor Element Material: SILICON

Silicon is a widely used material in semiconductors, providing excellent electrical properties and stability.

Maximum Drain Current (ID): 75 A

Reiterating the 75 A capability demonstrates consistency in performance metrics, ensuring reliability under load.

Maximum Drain-Source On Resistance: 0.023 ohm

Low on-resistance enhances efficiency, reducing heat loss during operation and improving overall system performance.

Terminal Position: SINGLE

A single-terminal position simplifies circuit design, making the integration of this FET effortless in various applications.

Technical Specifications

Power Field Effect Transistors (FET) STB75N15T4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Minimum DS Breakdown Voltage:

150 V

Maximum Drain Current (Abs) (ID):

75 A

Maximum Drain Current (ID):

75 A

Maximum Drain-Source On Resistance:

.023 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

300 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB75N15T4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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