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STB60NE03L-10

STMicroelectronics

STB60NE03L-10 by STMicroelectronics

STB60NE03L-10 by STMicroelectronics is a N-channel FET with 30V DS breakdown voltage, 240A IDM, and 0.015 ohm RDS(on). Ideal for switching applications, it features a built-in diode, operates in enhancement mode, and has a max power dissipation of 120W.

Median Price

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Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (In-Stock)

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Digiode

USA . 2,875 parts In-Stock

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2,875

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Anansix

USA . 1,250 parts In-Stock

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1,250

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Specialty Parts & Electronic Components, Inc. (S.P.E.C.)

USA . 792 parts In-Stock

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792

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ACDS - Activité Composants Distribution Service

France . 700 parts In-Stock

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700

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Vyrian

USA . 435 parts In-Stock

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435

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Fibra_Brandt Electronic GMBH

Germany . 50 parts In-Stock

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50

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 389 parts In-Stock

1+ parts

$1.299

100+ parts

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$1.169

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389

$1.299

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$1.169

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MKK Technologies

India . 277 parts In-Stock

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$2.443

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277

$2.443

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DigiPath Technology Company

USA . 277 parts In-Stock

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$2.443

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277

$2.443

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Corphita

USA . 1,715 parts In-Stock

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1,715

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Parana Technologies

USA . 598 parts In-Stock

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$1.553

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598

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$1.553

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Overview

Unleash the power and efficiency of the STB60NE03L-10 by STMicroelectronics, a top-tier manufacturer known for cutting-edge technology. As a high-quality N-CHANNEL Power Field Effect Transistor with a built-in diode, this product is perfect for various switching applications. Offering superior performance and reliability, this transistor ensures optimal functionality in any project. Experience seamless operation and unmatched durability with the STB60NE03L-10, making it the go-to choice for professionals seeking top-notch components. Elevate your projects to new heights with this exceptional product from STMicroelectronics.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components of the FET, ensuring a long lifespan.

Polarity or Channel Type: N-CHANNEL

Allows for efficient current flow and control in N-channel applications, providing reliable performance.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design by combining the FET with a diode, saving space and enhancing functionality.

Transistor Application: SWITCHING

Designed specifically for switching applications, making it ideal for use in power control circuits.

Surface Mount: YES

Easy to integrate onto circuit boards, offering convenience and flexibility in installation.

Minimum DS Breakdown Voltage: 30 V

Provides a margin of safety for voltage spikes or fluctuations, protecting the FET from damage.

Package Shape: RECTANGULAR

A standard shape that facilitates mounting and placement within electronic systems.

Terminal Form: GULL WING

Enables easy soldering and secure connection to the circuit board, ensuring reliable performance.

Operating Mode: ENHANCEMENT MODE

Allows for easy control of the FET's conductivity, making it versatile for various applications.

Maximum Pulsed Drain Current (IDM): 240 A

Handles high current pulses efficiently, suitable for demanding industrial or power supply applications.

Avalanche Energy Rating (EAS): 600 mJ

Withstands high energy spikes or surges, increasing the robustness of the FET in harsh operating conditions.

Maximum Drain Current (Abs) (ID): 60 A

Capable of handling high continuous current, providing reliable power control in various setups.

No. of Terminals: 2

Simplifies circuit connections and layout, reducing complexity in system design.

Maximum Power Dissipation (Abs): 120 W

Efficiently dissipates heat generated during operation, ensuring stable performance under load.

Package Style (Meter): SMALL OUTLINE

Compact form factor saves space on the circuit board, suitable for applications with limited space.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Ensures high electrical efficiency and reliability, enhancing overall performance of the FET.

Maximum Operating Temperature: 175 °C

Operates reliably at high temperatures, suitable for use in industrial or automotive applications.

Transistor Element Material: SILICON

Provides excellent conductivity and reliability, ensuring consistent performance over time.

Terminal Finish: TIN LEAD

Corrosion-resistant finish for terminals, ensuring long-term reliability in various environmental conditions.

Maximum Drain-Source On Resistance: 0.015 ohm

Low on-resistance minimizes power loss and improves efficiency in power control applications.

Terminal Position: SINGLE

Simplifies circuit connections and layout, reducing complexity in system design.

Case Connection: DRAIN

Standard connection type for drain terminals, ensuring compatibility with existing circuit designs.

Technical Specifications

Power Field Effect Transistors (FET) STB60NE03L-10 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

600 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.015 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB60NE03L-10 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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