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STB60N06-14T4

STMicroelectronics

STB60N06-14T4 by STMicroelectronics

STB60N06-14T4 from STMicroelectronics is a robust N-channel MOSFET designed for efficient switching applications. It features a max drain current of 60 A, a breakdown voltage of 60 V, and operates at up to 175 °C. Ideal for power management in compact designs, it ensures reliable performance with low on-resistance.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Anansix

USA . 1,925 parts In-Stock

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Vyrian

USA . 622 parts In-Stock

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622

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Digiode

USA . 466 parts In-Stock

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466

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 2,324 parts In-Stock

1+ parts

$0.551

100+ parts

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$0.496

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2,324

$0.551

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$0.496

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MKK Technologies

India . 2,078 parts In-Stock

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$1.036

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2,078

$1.036

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DigiPath Technology Company

USA . 2,078 parts In-Stock

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$1.036

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2,078

$1.036

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Corphita

USA . 2,196 parts In-Stock

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2,196

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Parana Technologies

USA . 1,058 parts In-Stock

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$0.659

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1,058

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$0.659

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Overview

Elevate your designs with the STB60N06-14T4 from STMicroelectronics—a trusted leader in cutting-edge semiconductor technology. This robust N-channel power FET excels in efficiency, delivering superior performance for applications like motor control and power management. Its compact form factor and built-in diode make integration a breeze, while exceptional thermal stability ensures reliability under demanding conditions. Unlock the potential of your projects with a component that's built to last!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability, thermal stability, and moisture resistance, making it suitable for a wide range of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher electron mobility, resulting in faster switching speeds, making them favorable for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides added protection against reverse voltage spikes, enhancing the reliability of the component.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently control loads in power circuits, improving overall system performance.

Surface Mount: YES

Surface mount technology allows for compact designs and better space utilization on PCBs, making it ideal for modern electronics.

Minimum DS Breakdown Voltage: 60 V

A minimum breakdown voltage of 60V ensures the device can handle moderate voltage applications safely.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space on the circuit board and enhances thermal performance.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and robust mechanical connections to the PCB.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for lower on-resistance and power loss, making the FET more efficient in its applications.

Maximum Pulsed Drain Current (IDM): 240 A

A pulsed drain current capacity of 240 A enables the FET to handle high load conditions without failure.

Avalanche Energy Rating (EAS): 600 mJ

The high avalanche energy rating offers enhanced reliability and resilience in applications subject to unexpected surges.

Maximum Drain Current (Abs) (ID): 60 A

Handling up to 60 A makes this FET suitable for high current applications, ensuring it can manage significant load without damage.

No. of Terminals: 2

A simple 2-terminal design reduces complexity and enhances ease of integration into circuits.

Maximum Power Dissipation (Abs): 150 W

With a power dissipation capability of 150 W, this FET can effectively manage heat in high-power applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style contributes to space efficiency and the ability to incorporate into compact electronic designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low drive power requirements, making it efficient and effective for various applications.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C ensures reliable performance in demanding environments.

Transistor Element Material: SILICON

Silicon is a well-established material that provides excellent electrical characteristics and is widely used in semiconductor applications.

Terminal Finish: MATTE TIN

Matte tin terminal finishes enhance solderability and protect against oxidation, ensuring reliable electrical connections.

Maximum Drain Current (ID): 60 A

Reiterating a maximum drain current of 60 A emphasizes the component's ability to handle heavy current loads in various applications.

Maximum Drain-Source On Resistance: 0.014 ohm

A low on-resistance of 0.014 ohms minimizes power loss and heat generation, improving efficiency during operation.

Terminal Position: SINGLE

The single terminal position simplifies the layout for PCB designers, allowing for straightforward integration into circuits.

Case Connection: DRAIN

With the case connection established at the drain, this FET can easily be integrated into various circuit configurations without complication.

Technical Specifications

Power Field Effect Transistors (FET) STB60N06-14T4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

600 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.014 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB60N06-14T4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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