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STB34N50DM2AG

STMicroelectronics

STB34N50DM2AG by STMicroelectronics

STB34N50DM2AG by STMicroelectronics is a robust N-channel FET designed for switching applications. It features a 500V breakdown voltage, 26A max drain current, and operates efficiently up to 150 °C. Ideal for power management in automotive and industrial systems.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Chip Stock

USA . 8,470 parts In-Stock

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8,470

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Vyrian

USA . 7,328 parts In-Stock

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7,328

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Digiode

USA . 3,352 parts In-Stock

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3,352

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Anansix

USA . 1,674 parts In-Stock

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1,674

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 553 parts In-Stock

1+ parts

$1.096

100+ parts

-

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$0.986

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-

553

$1.096

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$0.986

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Advanced Electronics

New Zealand . 2,500 parts In-Stock

1+ parts

$2.044

100+ parts

$1.860

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$1.676

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-

2,500

$2.044

$1.860

$1.676

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MKK Technologies

India . 1,366 parts In-Stock

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$2.060

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1,366

$2.060

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DigiPath Technology Company

USA . 1,366 parts In-Stock

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$2.060

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1,366

$2.060

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Component Stockers USA

USA . 647 parts In-Stock

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$6.110

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$4.500

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647

$6.110

$4.500

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AZTECH Wire

Italy . 866 parts In-Stock

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$14.110

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866

$14.110

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Microchip USA

USA . 9,089 parts In-Stock

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$21.021

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9,089

$21.021

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Corphita

USA . 4,284 parts In-Stock

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Alle Elektronik GmbH

Germany . 1,999 parts In-Stock

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Parana Technologies

USA . 564 parts In-Stock

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$1.310

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564

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Overview

Unlock the potential of your designs with the STB34N50DM2AG from STMicroelectronics—a leader in high-quality semiconductor solutions. This N-channel power FET delivers exceptional performance for switching applications, ensuring efficiency and reliability even in demanding environments. With robust durability and a compact design, it’s ideal for automotive and industrial uses. Trust in STMicroelectronics for superior technology that empowers innovation and drives your projects forward.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material provides a durable and lightweight structure, making it suitable for a variety of applications in harsh environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient for switching applications as they have lower on-resistance, providing better performance in power management.

Configuration: SINGLE WITH BUILT-IN DIODE

This configuration allows for easier circuit integration, providing both switching capabilities and protection in a single package.

Transistor Application: SWITCHING

Optimized for switching applications, this FET offers fast response times, enhancing overall system efficiency and performance.

Surface Mount: YES

Surface mount technology allows for higher assembly density and improved reliability in PCB applications, facilitating automated manufacturing processes.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage signifies excellent resistance to voltage spikes, making it suitable for high-voltage applications.

Package Shape: RECTANGULAR

The rectangular package shape is ideal for space-saving designs and efficient heat dissipation, which is crucial for power devices.

Terminal Form: GULL WING

Gull wing terminals ease the soldering process, enhancing production efficiency and ensuring a reliable connection to the circuit.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low off-state current and high on-state current capabilities, increasing energy efficiency during operation.

Maximum Pulsed Drain Current (IDM): 104 A

This high pulsed current rating makes the FET suitable for applications requiring rapid current surge handling, enhancing its versatility in demanding environments.

Avalanche Energy Rating (EAS): 700 mJ

The 700 mJ avalanche energy rating provides robust protection against energy surges, making this product reliable in transient voltage applications.

No. of Terminals: 2

A simple two-terminal design facilitates straightforward circuit integration while minimizing layout complexity.

Package Style (Meter): SMALL OUTLINE

The small outline design maximizes space efficiency on PCBs, allowing for more components in a compact design.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables high-speed operation and low power consumption, making it ideal for modern electronic applications.

Maximum Operating Temperature: 150 °C

A high operating temperature rating ensures reliable performance under extreme conditions, suitable for industrial applications.

Transistor Element Material: SILICON

Silicon as the transistor material ensures good thermal stability and performance, which is critical for long-term reliability.

Minimum Operating Temperature: -55 °C

Extended operational temperature range allows for reliable performance in extreme environments, increasing the product's applicability.

Terminal Finish: MATTE TIN

Matte tin finish enhances solderability and offers good corrosion resistance, contributing to long-term reliability in applications.

Maximum Drain Current (ID): 26 A

This high drain current capability supports a wide range of applications, from consumer electronics to industrial machinery.

Maximum Drain-Source On Resistance: 0.12 ohm

Low on-resistance minimizes power losses during operation, improving overall efficiency and thermal management in circuits.

Terminal Position: SINGLE

Single terminal positioning streamlines PCB layout and simplifies device integration for engineers.

Case Connection: DRAIN

The drain case connection ensures optimal thermal management, crucial for maintaining device performance during high load conditions.

Peak Reflow Temperature °C: 245

A peak reflow temperature of 245 °C is suitable for standard soldering processes, ensuring compatibility with modern PCB assembly techniques.

Reference Standard: AEC-Q101

Compliance with AEC-Q101 certification guarantees automotive-grade reliability, making this FET suitable for use in automotive applications.

Technical Specifications

Power Field Effect Transistors (FET) STB34N50DM2AG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

700 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (ID):

26 A

Maximum Drain-Source On Resistance:

.12 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

104 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB34N50DM2AG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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