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STB25NM60N

STMicroelectronics

STB25NM60N by STMicroelectronics

STB25NM60N from STMicroelectronics is a powerful N-channel FET designed for efficient switching applications. It features a 600V breakdown voltage, 21A max drain current, and built-in diode for enhanced performance. Ideal for compact power management solutions in electronics.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

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Chip Stock

USA . 7,395 parts In-Stock

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Vyrian

USA . 3,182 parts In-Stock

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Anansix

USA . 2,418 parts In-Stock

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Digiode

USA . 2,272 parts In-Stock

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Prism Electronics

USA . 4 parts In-Stock

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IDEA Electronic Components Group

UK . 666 parts In-Stock

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$0.295

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$0.266

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666

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$0.266

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MKK Technologies

India . 63 parts In-Stock

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$0.555

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63

$0.555

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DigiPath Technology Company

USA . 63 parts In-Stock

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$0.555

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63

$0.555

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AZTECH Wire

Italy . 379 parts In-Stock

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$14.710

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RC Electronics

USA . 44,098 parts In-Stock

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Authorized Procurement Solutions

USA . 25,000 parts In-Stock

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25,000

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A-Z Elektronik GmbH

Germany . 5,277 parts In-Stock

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Kepictronics

USA . 4,407 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,997 parts In-Stock

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Parana Technologies

USA . 2,161 parts In-Stock

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Corphita

USA . 918 parts In-Stock

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Perfect Parts

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Overview

Unlock superior performance with the STB25NM60N from STMicroelectronics, a leader in semiconductor innovation. This high-quality power FET excels in efficiency and reliability, making it ideal for demanding applications like switching and power management. Its robust design ensures durability in various environments, delivering exceptional value. Trust in STMicroelectronics to elevate your projects with enhanced operational efficiency and reduced energy costs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body ensures a lightweight and durable design, making the transistor suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

Being an N-channel FET allows for better performance in switching applications, providing lower on-resistance and higher efficiency.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances the versatility of the device, allowing for efficient operation in both forward and reverse conduction scenarios.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can toggle high currents effectively, making it an ideal choice for power management.

Surface Mount: YES

Surface mount technology offers compact design possibilities and simplifies circuit integration, reducing overall PCB footprint.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage ensures reliability in harsh environments and can handle higher voltage applications without failure.

Package Shape: RECTANGULAR

The rectangular shape optimizes space on the PCB while providing efficient heat dissipation properties.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and good mechanical bonding, enhancing the reliability of the electrical connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation enhances the control of the device, providing lower off-state leakage and faster switching capabilities.

Maximum Pulsed Drain Current (IDM): 84 A

A high pulsed drain current capability allows the transistor to handle transient loads and power spikes effectively, thereby increasing system robustness.

Avalanche Energy Rating (EAS): 850 mJ

The solid avalanche energy rating offers protection against sudden voltage spikes, enhancing the longevity and reliability of the transistor.

No. of Terminals: 2

A simplified 2-terminal design minimizes complexity in circuit design and reduces potential failure points.

Package Style (Meter): SMALL OUTLINE

The small outline package is ideal for space-constrained applications while maintaining performance, enabling design flexibility.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and excellent thermal stability, which improves overall circuit performance.

Transistor Element Material: SILICON

Silicon is the industry standard for transistors due to its excellent electrical properties, ensuring reliable operation and good performance.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish improves solderability and helps prevent the formation of whiskers, ensuring a long-lasting connection.

Maximum Drain Current (ID): 21 A

A maximum drain current of 21 A allows for versatility in various applications, providing the necessary current handling for powerful circuits.

Maximum Drain-Source On Resistance: 0.16 ohm

Low on-resistance minimizes power losses and heat generation, improving efficiency in power conversion applications.

Terminal Position: SINGLE

Single-terminal positions simplify connections and layout on the PCB, reducing assembly time and costs.

Maximum Time At Peak Reflow Temperature (s): 30

Supporting a longer peak reflow time allows for better soldering quality, ensuring improved assembly reliability.

Peak Reflow Temperature °C: 245

A peak reflow temperature of 245 °C is compatible with a wide range of solder materials, accommodating various manufacturing processes.

Technical Specifications

Power Field Effect Transistors (FET) STB25NM60N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

850 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (ID):

21 A

Maximum Drain-Source On Resistance:

.16 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

84 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB25NM60N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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