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STB21NM50N-1

STMicroelectronics

STB21NM50N-1 by STMicroelectronics

STB21NM50N-1 by STMicroelectronics is an N-channel MOSFET ideal for switching applications. It features a 500V breakdown voltage, 72A max pulsed drain current, and operates at up to 150 °C. This versatile FET ensures efficient power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Anansix

USA . 2,059 parts In-Stock

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2,059

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Vyrian

USA . 1,923 parts In-Stock

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Digiode

USA . 1,563 parts In-Stock

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1,563

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IDEA Electronic Components Group

UK . 1,998 parts In-Stock

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$0.602

100+ parts

-

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$0.542

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1,998

$0.602

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$0.542

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MKK Technologies

India . 1,146 parts In-Stock

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$1.131

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$1.131

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DigiPath Technology Company

USA . 1,146 parts In-Stock

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$1.131

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1,146

$1.131

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AZTECH Wire

Italy . 441 parts In-Stock

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$13.110

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441

$13.110

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Kepictronics

USA . 13,000 parts In-Stock

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13,000

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A-Z Elektronik GmbH

Germany . 6,572 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,089 parts In-Stock

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Authorized Procurement Solutions

USA . 2,500 parts In-Stock

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Perfect Parts

USA . 1,709 parts In-Stock

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Corphita

USA . 1,676 parts In-Stock

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Parana Technologies

USA . 1,117 parts In-Stock

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$0.719

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$0.719

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Assy Fe

Spain . 1,000 parts In-Stock

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Overview

Unlock the potential of your designs with the STB21NM50N-1 power FET from STMicroelectronics, a leader in semiconductor innovation. This robust N-channel transistor excels in switching applications, delivering exceptional efficiency and reliability. With a remarkable breakdown voltage of 500V and built-in diode functionality, it’s perfect for demanding environments. Trust in STMicroelectronics for quality that enhances performance and drives your success forward!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and protection against environmental factors, making the FET reliable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their efficiency in switching applications, allowing for faster operation and better performance.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances the safety and efficiency of the device by providing protection against reverse polarity.

Transistor Application: SWITCHING

Designed specifically for switching applications, it facilitates high-frequency operations which are essential in modern electronics.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage indicates that this FET can handle high voltages, making it suitable for demanding applications.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient space utilization on PCBs and ensures stable mounting.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robustness and ease of soldering, making it a good choice for prototyping and durable applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for lower power consumption during operation, enhancing device efficiency and lifespan.

Maximum Pulsed Drain Current (IDM): 72 A

The high maximum pulsed drain current indicates strong performance during short bursts of high power demands.

Avalanche Energy Rating (EAS): 480 mJ

A robust avalanche energy rating suggests this device can withstand momentary spikes in energy without failure.

Maximum Drain Current (Absolute) (ID): 18 A

A maximum drain current of 18 A makes this FET suitable for substantial load handling in various circuits.

Number of Terminals: 3

A 3-terminal configuration simplifies the design and layout of circuits, making it user-friendly for integration.

Maximum Power Dissipation (Absolute): 140 W

The high power dissipation capability ensures that this FET can operate efficiently without overheating.

Package Style (Meter): IN-LINE

The in-line package style is beneficial for assembly and fitting onto standard circuit boards.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology is ideal for digital and analog applications due to its high efficiency and low power consumption.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature indicates reliability in high-heat environments, giving it versatility in rugged applications.

Transistor Element Material: SILICON

Silicon is widely used and offers good thermal and electrical properties, contributing to the FET’s performance and reliability.

Terminal Finish: TIN

The tin finish improves solderability and corrosion resistance, ensuring good electrical connections over time.

Maximum Drain Current (ID): 18 A

Repeated mention of maximum drain current emphasizes its significance in ensuring strong operational capacity.

Maximum Drain-Source On Resistance: 0.19 ohm

The low on-resistance translates to greater efficiency, reducing power losses during operation.

Terminal Position: SINGLE

A single terminal position simplifies circuit design and layout, facilitating easier integration into existing systems.

Technical Specifications

Power Field Effect Transistors (FET) STB21NM50N-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

480 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

18 A

Maximum Drain Current (ID):

18 A

Maximum Drain-Source On Resistance:

.19 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

72 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB21NM50N-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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