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NVTFS5811NLWFTWG

Onsemi

NVTFS5811NLWFTWG by Onsemi

NVTFS5811NLWFTWG by Onsemi is a N-CHANNEL FET with 40A max drain current and 21W power dissipation. Ideal for high-power applications, it operates at up to 175 °C, making it suitable for industrial use in harsh environments. Its single configuration and surface mount design enhance ease of integration into various electronic systems.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 6,389 parts In-Stock

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6,389

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Digiode

USA . 1,499 parts In-Stock

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1,499

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AZTECH Wire

Italy . 819 parts In-Stock

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$16.530

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819

$16.530

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Kepictronics

USA . 48,237 parts In-Stock

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Problanco Electronics

Mexico . 7,550 parts In-Stock

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RC Electronics

USA . 7,500 parts In-Stock

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7,500

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SupplyDigital Components

Austria . 6,655 parts In-Stock

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TANS Electronics

Latvia . 5,305 parts In-Stock

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Kulean Microsystems

USA . 5,117 parts In-Stock

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Eastek

USA . 5,000 parts In-Stock

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$0.710

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Authorized Procurement Solutions

USA . 3,500 parts In-Stock

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3,500

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UHIMA Technologies

Türkiye . 605 parts In-Stock

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605

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Corphita

USA . 590 parts In-Stock

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Corohmni

South Africa . 292 parts In-Stock

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292

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Overview

Discover the power of the NVTFS5811NLWFTWG by Onsemi - a top-of-the-line N-CHANNEL Power Field Effect Transistor (FET) that offers unmatched quality and reliability. Manufactured by Onsemi, a trusted name in the industry, this single configuration transistor is perfect for a wide range of applications. With a maximum drain current of 40A and a power dissipation of 21W, this FET delivers exceptional performance and efficiency. Experience the value and benefits of this innovative technology, and elevate your projects to new heights with the NVTFS5811NLWFTWG.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs typically have lower on-resistance and higher efficiency compared to P-CHANNEL FETs, making them a good choice for many applications.

Configuration: SINGLE

SINGLE configuration simplifies circuit design and makes it easier to integrate into systems.

Surface Mount: YES

Surface mount technology allows for compact and efficient PCB designs, saving space and reducing assembly time.

Maximum Drain Current (Abs): 40 A

High maximum drain current rating allows the FET to handle high power applications without overheating or failing.

Maximum Power Dissipation (Abs): 21 W

High power dissipation rating ensures the FET can handle power spikes and continuous high power operation effectively.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductors offer good performance and reliability in a wide range of applications.

Maximum Operating Temperature: 175 °C

High maximum operating temperature ensures the FET can operate reliably in high temperature environments.

Terminal Finish: MATTE TIN

Matte tin finish provides good solderability and corrosion resistance, ensuring a reliable connection between the FET and the PCB.

Maximum Time At Peak Reflow Temperature (s): 30

Short reflow time helps prevent damage to the FET during assembly processes.

Peak Reflow Temperature °C: 260

High peak reflow temperature allows for efficient soldering during assembly without damaging the FET.

Technical Specifications

Power Field Effect Transistors (FET) NVTFS5811NLWFTWG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

40 A

Maximum Drain Current (ID):

40 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Maximum Operating Temperature:

175 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

NVTFS5811NLWFTWG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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