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NVMFS5C430NLWFT1G

Onsemi

NVMFS5C430NLWFT1G by Onsemi

NVMFS5C430NLWFT1G by Onsemi is a Power FET with 40V DS Breakdown Voltage, 900A IDM, and 0.0022 ohm RDS(on). Ideal for automotive applications due to AEC-Q101 standard compliance.

Median Price

$1.192

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

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Avnet

USA . 7,500 parts In-Stock

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Freelance Electronics

USA . 500 parts In-Stock

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$6.646

100+ parts

$6.978

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$6.579

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500

$6.646

$6.978

$6.579

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Flip Electronics

USA . 1,642,500 parts In-Stock

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Vyrian

USA . 5,940 parts In-Stock

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Digiode

USA . 1,941 parts In-Stock

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Corohmni

South Africa . 188 parts In-Stock

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Microchip USA

USA . 372 parts In-Stock

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$4.784

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AZTECH Wire

Italy . 734 parts In-Stock

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$8.290

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Component Stockers USA

USA . 5,716 parts In-Stock

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$11.710

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$11.130

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$10.780

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$10.780

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QUARKTWIN TECHNOLOGY LTD

USA . 14,573 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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SupplyDigital Components

Austria . 8,343 parts In-Stock

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Problanco Electronics

Mexico . 7,497 parts In-Stock

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Perfect Parts

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Kulean Microsystems

USA . 3,975 parts In-Stock

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Futuretech Components

Singapore . 2,980 parts In-Stock

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TANS Electronics

Latvia . 2,192 parts In-Stock

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Corphita

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UHIMA Technologies

Türkiye . 443 parts In-Stock

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Overview

Unleash the power of innovation with the NVMFS5C430NLWFT1G by Onsemi. This high-quality Power Field Effect Transistor (FET) offers unmatched performance and reliability, making it the perfect choice for a wide range of applications. With Onsemi's reputation for excellence in manufacturing, you can trust that this N-channel transistor delivers exceptional value and benefits. Whether you're looking to enhance your system efficiency or boost overall performance, the NVMFS5C430NLWFT1G is the ideal solution for your power management needs. Experience the difference with Onsemi today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body material ensures durability and reliability of the FET in various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility and lower ON resistance, making them suitable for high-power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for protection against reverse voltage, enhancing the overall reliability of the FET.

Surface Mount: YES

Surface mount packaging offers space-saving benefits and allows for automated assembly, making the FET suitable for compact electronic devices.

Minimum DS Breakdown Voltage: 40 V

The minimum breakdown voltage of 40 V ensures the FET can handle high voltage applications without risk of failure.

Maximum Pulsed Drain Current (IDM): 900 A

The high pulsed drain current rating of 900 A allows the FET to handle sudden spikes in current, making it ideal for applications with high inrush currents.

Avalanche Energy Rating (EAS): 493 mJ

The high avalanche energy rating of 493 mJ indicates the FET's ability to withstand high-energy pulses without breakdown, ensuring robust performance in harsh environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology provides high switching speeds and low ON resistance, making the FET suitable for high-frequency applications.

Maximum Drain-Source On Resistance: 0.0022 ohm

The low drain-source ON resistance of 0.0022 ohm results in minimal power loss and efficient operation, making the FET suitable for high-power applications.

Reference Standard: AEC-Q101

Compliance with AEC-Q101 automotive quality standard ensures the FET meets stringent reliability and performance requirements for automotive applications.

Technical Specifications

Power Field Effect Transistors (FET) NVMFS5C430NLWFT1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

493 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain-Source On Resistance:

.0022 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-F5

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

5

Operating Mode:

ENHANCEMENT MODE

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

900 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Trade Compliance

NVMFS5C430NLWFT1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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