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NVBLS0D5N04C

Onsemi

NVBLS0D5N04C by Onsemi

NVBLS0D5N04C by Onsemi is a N-CHANNEL Power FET with 40V DS Breakdown Voltage and 4700A IDM. Ideal for applications requiring high power dissipation, such as automotive systems. Featuring a built-in diode, it operates in enhancement mode with -55 to 175 °C temperature range.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 1,853 parts In-Stock

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Digiode

USA . 1,591 parts In-Stock

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Problanco Electronics

Mexico . 5,392 parts In-Stock

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TANS Electronics

Latvia . 4,702 parts In-Stock

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SupplyDigital Components

Austria . 3,616 parts In-Stock

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Kulean Microsystems

USA . 2,381 parts In-Stock

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Corphita

USA . 2,304 parts In-Stock

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UHIMA Technologies

Türkiye . 439 parts In-Stock

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Corohmni

South Africa . 130 parts In-Stock

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Overview

Discover the NVBLS0D5N04C by Onsemi, a high-quality Power Field Effect Transistor designed to exceed your expectations. With its N-CHANNEL configuration and built-in diode, this transistor offers unmatched performance for a wide range of applications. Experience the benefits of enhanced power efficiency and reliability, all in a compact package that is easy to install. Trust in Onsemi's reputation for excellence and innovation, as you elevate your projects to new heights with the NVBLS0D5N04C. Choose quality, choose reliability, choose Onsemi.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and resistance to various environmental conditions, making the FET reliable for long-term use.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower ON-resistance and higher current capabilities, making them suitable for high power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for easy protection against back EMF and can help simplify circuit design.

Minimum DS Breakdown Voltage: 40 V

With a minimum breakdown voltage of 40V, this FET can handle high voltage applications safely.

Surface Mount: YES

The surface mount capability makes it easier to integrate this FET into compact PCB designs.

Maximum Pulsed Drain Current (IDM): 4700 A

The high pulsed drain current rating allows this FET to handle short-term high power demands efficiently.

Avalanche Energy Rating (EAS): 1512 mJ

The high avalanche energy rating ensures reliable operation even in harsh conditions or during power surges.

Maximum Power Dissipation (Abs): 198.4 W

The high maximum power dissipation rating indicates the FET's ability to handle high power loads without overheating.

Maximum Operating Temperature: 175 °C

The high maximum operating temperature allows the FET to operate reliably in extreme temperature conditions.

Maximum Drain-Source On Resistance: 0.00057 ohm

With a low ON-resistance, this FET can efficiently handle high current without significant voltage drops.

Technical Specifications

Power Field Effect Transistors (FET) NVBLS0D5N04C attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

1512 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (ID):

300 A

Maximum Drain-Source On Resistance:

.00057 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

227 pF

JESD-30 Code:

R-PDSO-F9

No. of Elements:

1

No. of Terminals:

9

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

4700 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Element Material:

SILICON

Trade Compliance

NVBLS0D5N04C Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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