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NTR1P02LT3

Onsemi

NTR1P02LT3 by Onsemi

NTR1P02LT3 by Onsemi is a P-CHANNEL FET with 20V DS breakdown voltage, 1.3A max drain current, and 0.22 ohm max on resistance. Ideal for switching applications, it operates in enhancement mode with a max power dissipation of 0.4W at 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,455 parts In-Stock

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Vyrian

USA . 1,126 parts In-Stock

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Problanco Electronics

Mexico . 8,188 parts In-Stock

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TANS Electronics

Latvia . 6,726 parts In-Stock

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SupplyDigital Components

Austria . 5,842 parts In-Stock

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Corphita

USA . 1,115 parts In-Stock

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Kulean Microsystems

USA . 891 parts In-Stock

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UHIMA Technologies

Türkiye . 496 parts In-Stock

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Corohmni

South Africa . 330 parts In-Stock

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Overview

Enhance your electronic devices with the NTR1P02LT3 by Onsemi, a high-quality P-CHANNEL Small Signal Field Effect Transistor (FET) with a built-in diode. Perfect for applications requiring switching capabilities, this transistor offers a maximum drain current of 1.3A and a low drain-source on resistance of 0.22 ohm. With its advanced metal-oxide semiconductor technology and operating mode, this product ensures optimal performance and efficiency. Trust in Onsemi's reputation for excellence and reliability, and unlock the full potential of your projects with the NTR1P02LT3.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the transistor, ensuring long-term reliability.

Polarity or Channel Type: P-CHANNEL

Suitable for applications where P-channel transistors are required, providing flexibility in circuit design.

Configuration: SINGLE WITH BUILT-IN DIODE

Includes a built-in diode for protection and easier circuit design.

Transistor Application: SWITCHING

Specifically designed for switching applications, providing efficient performance in such scenarios.

Surface Mount: YES

Allows for easy and efficient mounting on circuit boards, saving space and simplifying manufacturing processes.

Minimum DS Breakdown Voltage: 20 V

With a high breakdown voltage, the transistor can handle higher voltages safely, increasing its versatility.

Package Shape: RECTANGULAR

The rectangular shape allows for compact placement on circuit boards, optimizing space usage.

Terminal Form: GULL WING

The gull wing terminal form provides secure connections and easy soldering during assembly.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for precise control and efficient performance in switching applications.

Maximum Drain Current (Abs) (ID): 1.3 A

Can handle high drain currents, suitable for a variety of applications that require such capabilities.

No. of Terminals: 3

With three terminals, the transistor can be easily integrated into various circuit designs.

Maximum Power Dissipation (Abs): 0.4 W

Capable of dissipating power effectively, preventing overheating and ensuring reliability.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the circuit board, ideal for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizes MOSFET technology, known for its high efficiency and fast switching speeds.

Maximum Operating Temperature: 150 °C

Can operate efficiently at high temperatures, suitable for a wide range of environments.

Transistor Element Material: SILICON

Silicon-based construction ensures reliability and performance in various operating conditions.

Terminal Finish: TIN LEAD

The tin-lead terminal finish provides good solderability and corrosion resistance for long-lasting connections.

Maximum Drain-Source On Resistance: 0.22 ohm

Low on-resistance ensures minimal power loss and high efficiency in switching applications.

Terminal Position: DUAL

Dual terminal positions offer flexibility in circuit design and ease of connection.

Peak Reflow Temperature °C: 235

Can withstand high reflow temperatures during manufacturing processes without compromising performance.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTR1P02LT3 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

1.3 A

Maximum Drain Current (ID):

1.3 A

Maximum Drain-Source On Resistance:

.22 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-236AB

JESD-30 Code:

R-PDSO-G3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTR1P02LT3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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