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NTMFS4H02NT3G

Onsemi

NTMFS4H02NT3G by Onsemi

NTMFS4H02NT3G by Onsemi is a single N-channel Power FET with 193A max drain current and 83W max power dissipation. Ideal for high-power applications, it operates at up to 150 °C and features metal-oxide semiconductor technology.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 3,624 parts In-Stock

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Digiode

USA . 2,140 parts In-Stock

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AZTECH Wire

Italy . 637 parts In-Stock

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$19.450

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637

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Component Stockers USA

USA . 633 parts In-Stock

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$99.990

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633

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SupplyDigital Components

Austria . 7,102 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 4,450 parts In-Stock

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TANS Electronics

Latvia . 4,386 parts In-Stock

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A-Z Elektronik GmbH

Germany . 2,367 parts In-Stock

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Corphita

USA . 1,635 parts In-Stock

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Kulean Microsystems

USA . 1,411 parts In-Stock

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Problanco Electronics

Mexico . 587 parts In-Stock

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UHIMA Technologies

Türkiye . 475 parts In-Stock

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Corohmni

South Africa . 319 parts In-Stock

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Overview

Elevate your power management game with the NTMFS4H02NT3G by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-notch quality and reliability. This N-CHANNEL Power FET is perfect for a variety of applications, offering high performance and efficiency. With a maximum drain current of 193 A and a maximum power dissipation of 83 W, this FET provides exceptional value and benefits to customers looking for a reliable and powerful solution. Say goodbye to worries about overheating or power failures - trust Onsemi's NTMFS4H02NT3G to deliver optimal performance every time.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs typically have better performance and lower resistance compared to P-CHANNEL FETs, making them suitable for high-power applications.

Configuration: SINGLE

Single configuration FETs are easier to control and design for specific circuit requirements, offering simplicity and efficiency in applications.

Surface Mount: YES

Surface mount technology allows for compact and space-saving designs, enhancing the overall efficiency and functionality of the product.

Maximum Drain Current (Abs) (ID): 193 A

High maximum drain current rating enables the FET to handle heavy loads and high-power requirements without the risk of overheating or failure.

Maximum Power Dissipation (Abs): 83 W

High power dissipation capability ensures the FET can operate efficiently under extreme conditions and prevent thermal issues, enhancing product reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductor FETs have low gate capacitance, high input impedance, and fast switching speeds, making them ideal for high-frequency and high-power applications.

Maximum Operating Temperature: 150 °C

High maximum operating temperature allows the FET to withstand harsh environments and extended operation without performance degradation, ensuring long-term reliability.

Terminal Finish: MATTE TIN

Matte Tin finish provides good solderability and corrosion resistance, ensuring a reliable electrical connection and longevity of the product in various operating conditions.

Maximum Time At Peak Reflow Temperature (s): 30

Short peak reflow time minimizes the risk of thermal stress or damage during soldering processes, optimizing the manufacturing efficiency and quality of the product.

Peak Reflow Temperature °C: 260

High peak reflow temperature ensures proper soldering and joint reliability, enabling the FET to maintain electrical continuity and performance under extreme thermal conditions.

Technical Specifications

Power Field Effect Transistors (FET) NTMFS4H02NT3G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

193 A

Maximum Drain Current (ID):

193 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

NTMFS4H02NT3G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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