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NTMFS4943NT3G

Onsemi

NTMFS4943NT3G by Onsemi

NTMFS4943NT3G by Onsemi is a N-CHANNEL FET with 30V DS Breakdown Voltage, ideal for SWITCHING applications. It features 125A IDM and 0.011 ohm RDS(ON), operating in ENHANCEMENT MODE at up to 150 °C. This RECTANGULAR package with DUAL terminals is designed for high-power efficiency in various electronic systems.

Median Price

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Lifecycle Status

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2

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1k+

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Vyrian

USA . 6,170 parts In-Stock

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Digiode

USA . 1,620 parts In-Stock

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AZTECH Wire

Italy . 86 parts In-Stock

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$14.660

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Problanco Electronics

Mexico . 7,074 parts In-Stock

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SupplyDigital Components

Austria . 5,171 parts In-Stock

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TANS Electronics

Latvia . 3,001 parts In-Stock

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Corphita

USA . 1,880 parts In-Stock

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Kulean Microsystems

USA . 1,183 parts In-Stock

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UHIMA Technologies

Türkiye . 511 parts In-Stock

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Corohmni

South Africa . 391 parts In-Stock

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Overview

Unleash the power of innovation with the NTMFS4943NT3G by Onsemi. As a leader in the industry, Onsemi's Power Field Effect Transistors (FET) are known for their exceptional quality and reliability. This N-CHANNEL transistor with a built-in diode is perfect for switching applications, offering maximum performance and efficiency. With a minimum DS Breakdown Voltage of 30V and a Maximum Pulsed Drain Current of 125A, this transistor is designed to meet the demands of today's technology. Trust Onsemi to deliver cutting-edge solutions that exceed expectations.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs generally have lower ON resistance and higher current carrying capacity compared to P-CHANNEL FETs, making them suitable for high-power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides protection against reverse polarity and allows for easy integration into circuits requiring diode functionality.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient and reliable performance in tasks requiring frequent switching on and off.

Surface Mount: YES

Surface mount technology allows for easy integration onto printed circuit boards, saving space and enabling automated assembly processes.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle higher voltage levels, making it suitable for a wide range of applications.

Package Shape: RECTANGULAR

The rectangular package shape provides a standard form factor for easy mounting and integration into various electronic systems.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer better control over the switching operation, allowing for precise modulation of the output signal.

Maximum Pulsed Drain Current (IDM): 125 A

The high maximum pulsed drain current rating ensures this FET can handle short-duration high current spikes, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 31 mJ

The high avalanche energy rating indicates the FET's ability to withstand energy spikes and voltage transients, ensuring robust performance in harsh environments.

No. of Terminals: 5

The 5-terminal configuration provides multiple connection points, enabling versatile circuit designs and allowing for additional functionality.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the PCB and allows for denser component placement, ideal for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high switching speeds and low gate drive requirements, making this FET efficient and reliable in operation.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high-temperature environments, ensuring stable performance under challenging conditions.

Transistor Element Material: SILICON

Silicon-based FETs offer excellent thermal stability and high breakdown voltage, providing long-term reliability and consistent performance.

Terminal Finish: Tin (Sn)

Tin terminal finish provides good solderability and corrosion resistance, ensuring reliable connections and long-term durability in various operating conditions.

Maximum Drain Current (ID): 8.3 A

The maximum drain current rating of 8.3A ensures the FET can handle high continuous currents, making it suitable for power-hungry applications.

Maximum Drain-Source On Resistance: 0.011 ohm

The low drain-source on resistance of 0.011 ohms reduces power loss and improves efficiency in the circuit, making this FET suitable for high-performance applications.

Terminal Position: DUAL

Dual terminal position allows for flexibility in circuit design and offers multiple connection options, enabling customized configurations for specific requirements.

Case Connection: DRAIN

The drain case connection simplifies circuit design and ensures proper thermal management, enhancing the overall performance and reliability of the FET.

Technical Specifications

Power Field Effect Transistors (FET) NTMFS4943NT3G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

31 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

8.3 A

Maximum Drain-Source On Resistance:

.011 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-F5

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

5

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

125 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMFS4943NT3G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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