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NTD4808N-35G

Onsemi

NTD4808N-35G by Onsemi

NTD4808N-35G by Onsemi is a Power FET with 30V DS Breakdown Voltage, 126A IDM, and 0.0124 ohm RDS(on). Ideal for switching applications, it features an N-CHANNEL configuration with built-in diode. Operating in enhancement mode, this transistor has a max power dissipation of 54.6W and can handle up to 175°C operating temperature.

Median Price

$0.127

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

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Rochester

USA . 5,105 parts In-Stock

1+ parts

-

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$0.132

1k+ parts

$0.110

10k+ parts

$0.098

5,105

-

$0.132

$0.110

$0.098

Verical

USA . 4,265 parts In-Stock

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$0.122

4,265

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$0.122

Distributors (In-Stock)

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Digiode

USA . 543 parts In-Stock

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$0.103

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543

$0.103

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Vyrian

USA . 2,655 parts In-Stock

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Distributors (Availability)

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Corphita

USA . 232 parts In-Stock

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$0.097

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232

$0.097

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Corohmni

South Africa . 424 parts In-Stock

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$0.108

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424

$0.108

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Advanced Electronics

New Zealand . 350 parts In-Stock

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$1.398

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$1.272

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$1.146

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-

350

$1.398

$1.272

$1.146

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AZTECH Wire

Italy . 1,073 parts In-Stock

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$10.480

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$10.480

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Continental Prestige Electronics

USA . 7,105 parts In-Stock

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$0.099

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$0.099

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Kepictronics

USA . 5,060 parts In-Stock

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Kulean Microsystems

USA . 3,128 parts In-Stock

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TANS Electronics

Latvia . 1,518 parts In-Stock

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Problanco Electronics

Mexico . 1,358 parts In-Stock

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SupplyDigital Components

Austria . 1,089 parts In-Stock

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GreenTree Electronics

Israel . 760 parts In-Stock

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UHIMA Technologies

Türkiye . 203 parts In-Stock

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Overview

Discover the power of the NTD4808N-35G by Onsemi, a top-quality Power Field Effect Transistor designed for switching applications. With unparalleled reliability and performance, this N-CHANNEL transistor offers customers exceptional value and benefits. From its single configuration with a built-in diode to its high maximum drain current and low on-resistance, this product delivers superior functionality for a wide range of electronic devices. Trust Onsemi's expertise in semiconductor technology and choose the NTD4808N-35G for your next project.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material provides durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance and higher electron mobility, offering better performance compared to P-channel FETs.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle higher voltage levels, enhancing its reliability in power switching applications.

Maximum Pulsed Drain Current (IDM): 126 A

The high pulsed drain current rating of 126A allows for efficient switching and handling of large current spikes, making it suitable for high-power applications.

Maximum Drain-Source On Resistance: 0.0124 ohm

The low on-resistance of 0.0124 ohms minimizes power loss and improves efficiency in switching operations, making it an ideal choice for power applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD4808N-35G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

144.5 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

63 A

Maximum Drain Current (ID):

9.8 A

Maximum Drain-Source On Resistance:

.0124 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

126 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD4808N-35G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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