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NTD4302

Onsemi

NTD4302 by Onsemi

NTD4302 by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a 30V DS Breakdown Voltage, 28A Pulsed Drain Current, and 0.01 ohm Drain-Source Resistance. The transistor operates in ENHANCEMENT MODE and has a max temperature of 150 °C.

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9

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Vyrian

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Semi Source

USA . 773 parts In-Stock

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Digiode

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Prism Electronics

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NexGen Digital

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LIBRA Elektronik GmbH

Germany . 169 parts In-Stock

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Component Sense

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BCID Electronics Ltd.

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Speed Components Ltd

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AZTECH Wire

Italy . 1,037 parts In-Stock

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Kepictronics

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RC Electronics

USA . 9,000 parts In-Stock

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TANS Electronics

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Kulean Microsystems

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A-Z Elektronik GmbH

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Problanco Electronics

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SupplyDigital Components

Austria . 1,399 parts In-Stock

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Corphita

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Perfect Parts

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UHIMA Technologies

Türkiye . 381 parts In-Stock

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Corohmni

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Overview

Looking to power up your devices with efficiency and reliability? Look no further than the NTD4302 by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-notch Power Field Effect Transistors (FET) like the NTD4302, which boasts a range of applications from switching to enhancement mode operation. With a high DS Breakdown Voltage and maximum Drain Current, this N-Channel FET offers exceptional performance and durability. Trust Onsemi for quality products that provide value and benefits to customers seeking top-tier components for their electronic projects.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components of the FET, ensuring long-term reliability.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have lower ON resistance and higher efficiency compared to P-channel FETs, making them suitable for many applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode can help protect the circuit from reverse voltage spikes, enhancing the robustness of the FET in demanding applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast and efficient operation.

Surface Mount: YES

Allows for easy and space-efficient mounting on PCBs, making it suitable for compact electronic devices.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer high gain and low ON resistance, providing efficient operation in various switching applications.

Maximum Pulsed Drain Current (IDM): 28 A

Capable of handling high current pulses, making it suitable for applications requiring intermittent high-power operation.

Avalanche Energy Rating (EAS): 722 mJ

High avalanche energy rating ensures the FET can withstand voltage spikes and transient overloads without damage.

Maximum Drain-Source On Resistance: 0.01 ohm

Low ON resistance leads to minimal power loss and heat generation, improving overall efficiency of the FET.

Maximum Operating Temperature: 150 °C

Can operate reliably at elevated temperatures, suitable for industrial and automotive applications where temperature can vary.

Technical Specifications

Power Field Effect Transistors (FET) NTD4302 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED, LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

722 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

8.4 A

Maximum Drain Current (ID):

8.4 A

Maximum Drain-Source On Resistance:

.01 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

28 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD4302 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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