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NTD3055-150

Onsemi

NTD3055-150 by Onsemi

NTD3055-150 by Onsemi is a Power FET with N-channel configuration, suitable for switching applications. It features a 60V min DS breakdown voltage, 27A max pulsed drain current, and 0.15 ohm max drain-source resistance. Ideal for enhancing performance in small outline packages at up to 175 °C operating temperature.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 1,837 parts In-Stock

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Digiode

USA . 197 parts In-Stock

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Ampacity Inc.

Singapore . 1,566 parts In-Stock

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$15.050

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TANS Electronics

Latvia . 7,665 parts In-Stock

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SupplyDigital Components

Austria . 7,191 parts In-Stock

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Problanco Electronics

Mexico . 7,116 parts In-Stock

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A-Z Elektronik GmbH

Germany . 2,040 parts In-Stock

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Corphita

USA . 995 parts In-Stock

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995

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Kulean Microsystems

USA . 615 parts In-Stock

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Corohmni

South Africa . 306 parts In-Stock

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UHIMA Technologies

Türkiye . 121 parts In-Stock

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Overview

Discover the NTD3055-150 by Onsemi, a high-quality Power Field Effect Transistor designed for switching applications. With its N-channel configuration and built-in diode, this transistor offers reliability and efficiency in various electronic devices. Benefit from Onsemi's reputation for excellence in semiconductor technology and trust in the superior performance of this product. Upgrade your projects with the NTD3055-150 and experience the value it brings to your designs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection, ensuring a long lifespan for the product.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer higher mobility and lower resistance, making them efficient for switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can provide fast response and reliable operation.

Surface Mount: YES

Surface mount capability makes installation easier and allows for compact, space-saving designs.

Minimum DS Breakdown Voltage: 60 V

With a high breakdown voltage, this FET can handle higher voltages without risk of failure.

Maximum Drain Current (ID): 9 A

Capable of handling high current loads, making it suitable for power electronics applications.

Maximum Power Dissipation (Abs): 1.5 W

Efficient power dissipation capability ensures the FET can operate reliably without overheating.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

This technology offers high efficiency and fast switching speeds, ideal for power switching applications.

Maximum Operating Temperature: 175 °C

Designed to operate at high temperatures, making it suitable for demanding environments.

Maximum Drain-Source On Resistance: 0.15 ohm

Low on-resistance ensures minimal power loss and efficient operation.

Technical Specifications

Power Field Effect Transistors (FET) NTD3055-150 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

30 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

9 A

Maximum Drain Current (ID):

9 A

Maximum Drain-Source On Resistance:

.15 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

27 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD3055-150 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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