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MGSF1N03LT1

Onsemi

MGSF1N03LT1 by Onsemi

MGSF1N03LT1 by Onsemi is a N-CHANNEL FET with 30V DS Breakdown Voltage, ideal for SWITCHING applications. It features a max Drain Current of 1.6A, 0.1 ohm Drain-Source Resistance, and operates in ENHANCEMENT MODE. This small outline transistor has GULL WING terminals and can withstand temperatures up to 150°C.

Median Price

$0.600

Lifecycle Status

Suppliers In-Stock

14

In-Stock Inventory

1k+

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Freelance Electronics

USA . 964 parts In-Stock

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$0.130

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$0.137

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Bristol Electronics

USA . 2,525 parts In-Stock

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$0.600

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$0.300

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American Microsemiconductor Inc.

USA . 140 parts In-Stock

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$2.340

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Prism Electronics

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Digiode

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Odintec Ltd.

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ComSIT Distribution GmbH

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PC Components Company LLC

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Flex Direct, LLC

USA . 657 parts In-Stock

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Microfarads

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Nova Conductors

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Corohmni

South Africa . 132 parts In-Stock

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AZTECH Wire

Italy . 609 parts In-Stock

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$9.950

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609

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Ampacity Inc.

Singapore . 879 parts In-Stock

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$16.050

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Semicontronic

India . 1,597 parts In-Stock

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$60.050

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$58.549

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Component Stockers USA

USA . 789 parts In-Stock

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Metaverse IC Inc.

Canada . 56,820 parts In-Stock

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Lixinc

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Kulean Microsystems

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Problanco Electronics

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Argo Parts USA

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Authorized Procurement Solutions

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TANS Electronics

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UHIMA Technologies

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Bastille Electronics

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Continental Prestige Electronics

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Corphita

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Overview

Discover the MGSF1N03LT1 by Onsemi, a top-of-the-line Small Signal Field Effect Transistor designed for high-performance switching applications. With Onsemi's reputation for excellence in semiconductor manufacturing, this N-channel transistor offers customers unparalleled quality and reliability. Its compact design and built-in diode make it ideal for a wide range of electronic devices, providing efficient power management and enhanced functionality. Experience the value and benefits of the MGSF1N03LT1 and take your projects to the next level with this innovative component.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material makes the transistor lightweight and durable, allowing for easy handling and long-term reliability.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are commonly used in switching applications, offering good performance and efficiency.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and protects the transistor from reverse voltage, enhancing its functionality.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor provides fast switching speeds and efficient performance.

Surface Mount: YES

The surface mount capability allows for easy and efficient PCB assembly, saving space and reducing overall system cost.

Minimum DS Breakdown Voltage: 30 V

With a high breakdown voltage, this transistor can handle higher voltages without breakdown, ensuring reliability in operation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors offer better control over the current flow, resulting in improved efficiency and performance.

Maximum Drain Current (Abs) (ID): 1.6 A

The high maximum drain current allows for handling higher currents, making this transistor suitable for a wide range of applications.

Maximum Power Dissipation (Abs): 0.42 W

The high power dissipation capability ensures that the transistor can handle heat effectively, preventing overheating and ensuring long-term reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high efficiency, low power consumption, and fast operation, making it an ideal choice for modern electronic devices.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this transistor can operate reliably in a wide range of environmental conditions, ensuring durability.

Maximum Drain-Source On Resistance: 0.1 ohm

The low drain-source on resistance minimizes power loss and improves efficiency, making this transistor suitable for high-performance applications.

Technical Specifications

Small Signal Field Effect Transistors (FET) MGSF1N03LT1 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

1.6 A

Maximum Drain Current (ID):

1.6 A

Maximum Drain-Source On Resistance:

.1 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-236

JESD-30 Code:

R-PDSO-G3

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin/Lead (Sn/Pb)

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MGSF1N03LT1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

NSN

5961-01-533-4774, 5961015334774

NIIN

015334774

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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