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FCA20N60S

Onsemi

FCA20N60S by Onsemi

FCA20N60S by Onsemi is a Power FET with 600V DS Breakdown Voltage, 20A Drain Current, and 0.26 ohm On Resistance. Ideal for switching applications, it operates in Enhancement Mode with 60A Pulsed Drain Current and 450mJ Avalanche Energy Rating.

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Lifecycle Status

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3

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1k+

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Chip Stock

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Andel Nordic

Denmark . 159 parts In-Stock

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$5.195

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$4.988

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Native Components

USA . 557 parts In-Stock

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$10.070

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Northwest PG Solutions

USA . 447 parts In-Stock

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$11.077

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$9.969

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Metaverse IC Inc.

Canada . 25,000 parts In-Stock

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Lixinc

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Problanco Electronics

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TANS Electronics

Latvia . 6,572 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,348 parts In-Stock

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Kepictronics

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Glotronic Ltd.

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Alle Elektronik GmbH

Germany . 3,565 parts In-Stock

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Corphita

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Kulean Microsystems

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Supply Digital

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SupplyDigital Components

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Corohmni

South Africa . 435 parts In-Stock

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UHIMA Technologies

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Overview

Unleash the power of innovation with the FCA20N60S by Onsemi. Experience top-notch quality and reliability from a manufacturer known for excellence in the field of Power Field Effect Transistors (FET). With its N-CHANNEL configuration and built-in diode, this transistor is perfect for switching applications. Offering a high DS Breakdown Voltage of 600V and a maximum Drain Current of 20A, this product provides exceptional performance and efficiency. Take your projects to the next level with the FCA20N60S – where quality meets value.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material makes the transistor lightweight and durable, allowing for easy handling and installation in various applications.

Polarity or Channel Type: N-CHANNEL

The N-channel type offers efficient performance in switching applications and provides better conductivity for the desired operation.

Minimum DS Breakdown Voltage: 600 V

With a minimum breakdown voltage of 600 V, this FET can handle high voltage applications with reliability and safety.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast switching speeds and efficient performance in control circuits.

Maximum Pulsed Drain Current (IDM): 60 A

The high pulsed drain current rating of 60 A allows for handling sudden spikes in current without compromising the device's functionality.

Avalanche Energy Rating (EAS): 450 mJ

The high avalanche energy rating of 450 mJ ensures the FET can withstand transient energy spikes, making it reliable in rugged operating conditions.

Maximum Power Dissipation (Abs): 260 W

The high maximum power dissipation rating of 260 W ensures the FET can handle high power levels without overheating or damage.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can operate in high-temperature environments without performance degradation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The metal-oxide semiconductor technology offers improved efficiency and reliability in electronic circuits, making this FET a preferred choice for various applications.

Maximum Drain-Source On Resistance: 0.26 ohm

The low drain-source on resistance of 0.26 ohm ensures minimal power loss and efficient operation in power switching applications.

Technical Specifications

Power Field Effect Transistors (FET) FCA20N60S attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

450 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

20 A

Maximum Drain Current (ID):

20 A

Maximum Drain-Source On Resistance:

.26 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

85 pF

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

60 A

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

550 ns

Maximum Turn On Time (ton):

370 ns

Trade Compliance

FCA20N60S Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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