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BF901R-TAPE-7

NXP Semiconductors

BF901R-TAPE-7 by NXP Semiconductors

BF901R-TAPE-7 by NXP Semiconductors is an N-channel RF FET designed for amplifier applications. It features a 12V min DS breakdown voltage, operates in the ultra-high frequency band, and supports dual gate enhancement mode. This compact surface mount device ensures reliable performance up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Anansix

USA . 1,899 parts In-Stock

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Vyrian

USA . 1,803 parts In-Stock

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Digiode

USA . 117 parts In-Stock

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Native Components

USA . 510 parts In-Stock

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$29.390

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510

$29.390

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Northwest PG Solutions

USA . 2,123 parts In-Stock

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$32.329

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$29.096

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One Stop Electronics

USA . 1,555 parts In-Stock

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$49.050

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$49.050

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UNI Independent Distributors

Spain . 3,794 parts In-Stock

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Corphita

USA . 3,342 parts In-Stock

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Overview

Unlock the potential of your designs with the BF901R-TAPE-7 from NXP Semiconductors, a trusted leader in innovative technology. This high-performance RF small signal FET delivers exceptional amplification in a compact, surface-mount package, making it ideal for ultra-high frequency applications. Experience superior reliability and efficiency while benefitting from NXP's commitment to quality and cutting-edge solutions that elevate your projects to new heights.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and protection against moisture and environmental factors, ensuring reliability in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher efficiency and faster switching, making them ideal for amplification needs in RF applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances circuit protection and simplifies design by integrating multiple functions into a single package.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this transistor is suited for applications requiring signal enhancement, such as RF transmission.

Surface Mount: YES

Surface mount technology allows for compact designs, making it easier to integrate into modern electronic devices with limited space.

Minimum DS Breakdown Voltage: 12 V

A minimum breakdown voltage of 12 V provides sufficient margin for performance in high-voltage applications, ensuring safety and reliability.

Package Shape: RECTANGULAR

The rectangular shape aids in efficient placement on PCBs and optimizes space management in electronic device designs.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and enhance the mechanical strength of connections, making for a reliable and robust assembly.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

The dual gate configuration allows for better control of signals, which is beneficial in complex RF and amplifier applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Capable of operating in the ultra-high frequency band, this transistor supports high-speed communications, critical for RF applications.

No. of Terminals: 4

A 4-terminal configuration simplifies connections and integration into more complex circuits, enhancing design flexibility.

Package Style (Meter): SMALL OUTLINE

The small outline package style contributes to compact designs and is well-suited for modern electronic devices that require miniaturization.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures better performance characteristics, including high input impedance and low power consumption, making it efficient for amplifying signals.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature provides versatility in application, enabling reliable performance even in demanding environments.

Transistor Element Material: SILICON

Silicon is the foundational material in semiconductor technology, offering excellent electrical performance and stability.

Maximum Drain Current (ID): 0.03 A

A maximum drain current of 0.03 A makes this transistor suitable for low-power applications while still delivering effective amplification.

Terminal Position: DUAL

The dual terminal position helps in achieving balanced designs and ensures optimal signal performance in circuits.

Case Connection: SOURCE

Having the source as a case connection aids in thermal management and improves overall device performance.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF901R-TAPE-7 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Additional Features:

LOW NOISE

Case Connection:

SOURCE

Minimum DS Breakdown Voltage:

12 V

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF901R-TAPE-7 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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