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BF901R-TAPE-13

NXP Semiconductors

BF901R-TAPE-13 by NXP Semiconductors

BF901R-TAPE-13 by NXP Semiconductors is an N-channel RF FET designed for amplifier applications, featuring a 12V min breakdown voltage and operating in the ultra-high frequency band. Its dual gate enhancement mode allows efficient signal processing. This compact surface mount device operates at a max temp of 150 °C with a 0.03A drain current.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 1,333 parts In-Stock

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Digiode

USA . 947 parts In-Stock

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Anansix

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Native Components

USA . 397 parts In-Stock

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$5.287

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One Stop Electronics

USA . 1,279 parts In-Stock

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$62.050

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UNI Independent Distributors

Spain . 5,367 parts In-Stock

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Corphita

USA . 3,708 parts In-Stock

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Northwest PG Solutions

USA . 1,221 parts In-Stock

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Overview

Unlock unparalleled performance with the BF901R-TAPE-13 from NXP Semiconductors. Trusted for excellence, NXP delivers innovative RF Small Signal FETs that represent the pinnacle of reliability and efficiency. Designed for versatile applications like amplifiers, this compact powerhouse ensures superior signal integrity in ultra-high frequency ranges. Elevate your projects with a component that not only meets but exceeds industry standards, bringing you unmatched value and peace of mind.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body provides durability and resistance to environmental factors, making the product reliable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally preferred for high-speed switching applications, offering lower on-resistance and higher efficiency.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps in protecting the circuit from voltage spikes, adding an extra layer of reliability to the system.

Transistor Application: AMPLIFIER

Designed for amplifier applications, this product can effectively enhance signals with minimal distortion, making it suitable for audio and RF applications.

Surface Mount: YES

Being surface mount enables compact circuit design and better thermal performance, appealing to modern electronics needing space-efficient designs.

Minimum DS Breakdown Voltage: 12 V

A minimum breakdown voltage of 12V allows this FET to operate effectively in higher voltage applications, providing flexibility for various designs.

Package Shape: RECTANGULAR

The rectangular shape is optimized for efficient space utilization on PCBs, making it suitable for dense circuit layouts.

Terminal Form: GULL WING

Gull wing terminals offer good solder joint reliability, ensuring effective connections in high-frequency applications.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

The dual gate and enhancement mode operation allow for improved gain and performance in specific applications, particularly in RF and analog signal processing.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Designed for ultra high frequency bands, this FET is ideal for applications like RF amplifiers and mixers, ensuring high performance in communication systems.

No. of Terminals: 4

With 4 terminals, this FET can be easily integrated into various electronic designs, providing flexibility and ease of connections.

Package Style (Meter): SMALL OUTLINE

The small outline package style allows for high-density mounting, making it suitable for compact electronic products.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and lower power consumption, making this FET suitable for battery-powered devices.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature ensures reliable performance in demanding environments, broadening application possibilities.

Transistor Element Material: SILICON

Silicon offers excellent electronic properties, contributing to the overall efficiency and effectiveness of the FET in various applications.

Maximum Drain Current (ID): 0.03 A

A maximum drain current of 30 mA makes this FET suitable for low to moderate power applications, enhancing its versatility.

Terminal Position: DUAL

Dual terminal positions facilitate easier routing in PCB layouts, improving design flexibility and effectiveness.

Case Connection: SOURCE

Connecting the case to the source can help in thermal dissipation, enhancing reliability in high-power scenarios.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF901R-TAPE-13 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Additional Features:

LOW NOISE

Case Connection:

SOURCE

Minimum DS Breakdown Voltage:

12 V

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF901R-TAPE-13 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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