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MT41J128M16JT-125

Micron Technology

MT41J128M16JT-125 by Micron Technology

MT41J128M16JT-125 by Micron Technology is a DDR3 DRAM with 128MX16 organization, operating at a max clock frequency of 800 MHz. It has a memory density of 2GB and is commonly used in automotive applications due to its AEC-Q100 screening level.

Median Price

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Lifecycle Status

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5

In-Stock Inventory

1k+

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Chip Stock

USA . 23,200 parts In-Stock

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Vyrian

USA . 460 parts In-Stock

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Martec Srl

Italy . 300 parts In-Stock

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300

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Digiode

USA . 227 parts In-Stock

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Nova Conductors

Japan . 65 parts In-Stock

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Corohmni

South Africa . 17 parts In-Stock

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$5.562

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Aztec Data Supply Inc.

USA . 4,103 parts In-Stock

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$5.610

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Semicontronic

India . 144 parts In-Stock

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$7.000

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$6.825

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$6.790

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144

$7.000

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$6.790

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Ampacity Inc.

Singapore . 289 parts In-Stock

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$18.000

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AZTECH Wire

Italy . 606 parts In-Stock

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S.R.D Solutions

India . 30,000 parts In-Stock

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Continental Prestige Electronics

USA . 2,884 parts In-Stock

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Argo Parts USA

USA . 1,939 parts In-Stock

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Corphita

USA . 1,308 parts In-Stock

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Bastille Electronics

Australia . 450 parts In-Stock

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Overview

Discover the MT41J128M16JT-125 by Micron Technology, a top-quality DDR3 DRAM that delivers unrivaled performance and reliability. With Micron Technology's reputation for excellence, you can trust that this product is built to last. Whether you're using it for gaming, multimedia editing, or data-intensive applications, this DRAM will exceed your expectations. Experience faster processing speeds and seamless multitasking, thanks to its synchronous operating mode and common input/output type. The compact design and thin profile make it easy to integrate into any system. Upgrade your device with the MT41J128M16JT-125 and unlock its full potential.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material used in the package body enhances the durability and reliability of the DRAM, making it suitable for various applications.

Surface Mount: YES

With surface mount capability, this DRAM can be easily mounted on circuit boards, simplifying the manufacturing process and enabling efficient integration into electronic devices.

No. of Functions: 1

The DRAM with a single function provides a focused and streamlined solution for memory operations, ensuring optimal performance and ease of use.

Screening Level: AEC-Q100

Complying with the AEC-Q100 screening level, this DRAM meets the stringent automotive industry requirements for reliability, making it an excellent choice for automotive applications.

Package Shape: RECTANGULAR

The rectangular package shape facilitates straightforward installation and integration of the DRAM, saving space and enabling flexibility in design.

Operating Mode: SYNCHRONOUS

The synchronous operating mode of this DRAM allows for synchronized memory access, leading to improved system performance and efficiency.

Self Refresh: YES

Equipped with self-refresh capability, this DRAM can autonomously refresh its contents, reducing the burden on the system and ensuring data integrity during low-power modes.

Input/Output Type: COMMON

Featuring a common input/output type, this DRAM supports standard interface protocols, facilitating compatibility and ease of use in various systems.

Nominal Supply Voltage / Vsup (V): 1.5

With a nominal supply voltage of 1.5V, this DRAM offers efficient power consumption and optimal performance, making it an energy-efficient choice.

No. of Terminals: 96

With 96 terminals, this DRAM provides a sufficient number of connections for reliable data transfer and efficient communication with the system.

Package Style (Meter): GRID ARRAY, THIN PROFILE, FINE PITCH

The grid array package style, combined with a thin profile and fine pitch, enhances the mechanical stability and electrical performance of the DRAM, making it ideal for high-density memory applications.

Organization: 128MX16

With an organization of 128 megabits by 16, this DRAM offers a high memory capacity and efficient data organization, enabling it to handle complex tasks and large amounts of information.

Terminal Finish: TIN SILVER COPPER

The terminal finish of tin silver copper enhances conductivity, reliability, and corrosion resistance, ensuring stable and efficient communication between the DRAM and the system.

Terminal Position: BOTTOM

With the terminals positioned at the bottom, this DRAM provides straightforward and secure connections, optimizing space utilization and facilitating system integration.

No. of Ports: 1

The presence of a single port ensures simplified data access and efficient data transfer, making this DRAM suitable for various applications.

Maximum Seated Height: 1.2 mm

With a maximum seated height of 1.2mm, this low-profile DRAM enables compact designs and allows for efficient heat dissipation in space-constrained environments.

Maximum Clock Frequency (fCLK): 800 MHz

Operating at a maximum clock frequency of 800 MHz, this DRAM delivers high-speed memory performance, enabling quick and responsive data access.

Width: 8 mm

The compact width of 8mm makes this DRAM suitable for space-limited designs, ensuring easy integration and flexibility in various electronic devices.

Minimum Supply Voltage (Vsup): 1.425 V

With a minimum supply voltage of 1.425V, this DRAM offers improved energy efficiency and reduced power consumption, making it an environmentally friendly option.

Maximum Time At Peak Reflow Temperature (s): 30

The maximum time allowed at peak reflow temperature of 30 seconds ensures proper soldering and component reliability during the manufacturing process.

Peak Reflow Temperature °C: 260

With a peak reflow temperature of 260°C, this DRAM can withstand high-temperature soldering processes, ensuring robust solder joints and reliable operation.

Length: 14 mm

The compact length of 14mm allows for space-efficient integration of this DRAM in various electronic systems, providing flexibility in design and installation.

Access Mode: MULTI BANK PAGE BURST

The multi-bank page burst access mode enhances efficiency and data throughput by enabling simultaneous access to multiple memory banks, making this DRAM ideal for demanding applications.

Technology: CMOS

Utilizing complementary metal-oxide-semiconductor (CMOS) technology, this DRAM offers low power consumption, high performance, and high noise immunity, making it a reliable and efficient choice.

Terminal Form: BALL

The ball terminal form ensures secure and reliable connections, enabling robust communication and minimizing the risk of disconnection or signal loss.

No. of Words: 134217728 words

With a high number of words (134,217,728), this DRAM provides a large memory capacity, enabling the storage and processing of extensive data for diverse applications.

Sequential Burst Length: 8

The sequential burst length of 8 optimizes data transfer efficiency and enables efficient memory utilization, contributing to improved system performance.

Memory Width: 16

With a memory width of 16, this DRAM supports high-speed data transfer and efficient data handling, enhancing overall system performance.

Terminal Pitch: 0.8 mm

The narrow terminal pitch of 0.8mm allows for compact integration and efficient space utilization, making this DRAM suitable for miniaturized electronic devices.

No. of Words Code: 128M

The 128M words code signifies a high memory capacity, ensuring ample storage space for data-intensive applications, making this DRAM a reliable choice.

Maximum Supply Voltage (Vsup): 1.575 V

With a maximum supply voltage of 1.575V, this DRAM ensures reliable operation and proper functioning within specified voltage ranges.

Memory Density: 2147483648 bit

Boasting a memory density of 2,147,483,648 bits, this DRAM provides ample storage capacity, accommodating extensive data requirements for demanding applications.

Memory IC Type: DDR3 DRAM

Being a DDR3 DRAM, this memory IC offers high-speed data transfer rates and improved performance compared to previous generation memory technologies, making it an excellent choice for advanced computing applications.

Refresh Cycles: 8192

With a refresh cycle of 8192, this DRAM ensures data integrity by automatically refreshing stored data within specified time intervals, extending the lifespan of the memory and maintaining stable performance.

Interleaved Burst Length: 8

The interleaved burst length of 8 enhances data access efficiency and enables simultaneous retrieval of multiple data sets, improving overall system responsiveness and multitasking capabilities.

Technical Specifications

DRAM MT41J128M16JT-125 attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

MULTI BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH

Maximum Clock Frequency (fCLK):

800 MHz

Input/Output Type:

COMMON

Interleaved Burst Length:

8

JESD-30 Code:

R-PBGA-B96

JESD-609 Code:

e1

Length:

14 mm

Memory Density:

2147483648 bit

Memory IC Type:

Memory Width:

16

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

96

No. of Words:

134217728 words

No. of Words Code:

128M

Operating Mode:

SYNCHRONOUS

Organization:

128MX16

Package Body Material:

PLASTIC/EPOXY

Package Code:

Package Equivalence Code:

BGA96,9X16,32

Package Shape:

Package Style (Meter):

GRID ARRAY, THIN PROFILE, FINE PITCH

Peak Reflow Temperature (C):

260

Refresh Cycles:

Screening Level:

AEC-Q100

Maximum Seated Height:

1.2 mm

Self Refresh:

YES

Sequential Burst Length:

8

Maximum Supply Voltage (Vsup):

1.575 V

Minimum Supply Voltage (Vsup):

1.425 V

Nominal Supply Voltage / Vsup (V):

1.5

Surface Mount:

YES

Technology:

CMOS

Terminal Finish:

TIN SILVER COPPER

Terminal Form:

BALL

Terminal Pitch:

.8 mm

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

30

Width:

8 mm

Trade Compliance

MT41J128M16JT-125 Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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