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STL60N32N3LL

STMicroelectronics

STL60N32N3LL by STMicroelectronics

STL60N32N3LL by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 60 A, a breakdown voltage of 30 V, and operates at up to 150 °C. Ideal for compact designs with its no-lead surface mount package.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 4,831 parts In-Stock

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Anansix

USA . 2,342 parts In-Stock

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Digiode

USA . 715 parts In-Stock

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IDEA Electronic Components Group

UK . 1,683 parts In-Stock

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$1.582

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$1.424

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$1.582

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$1.424

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MKK Technologies

India . 10 parts In-Stock

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$2.976

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10

$2.976

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DigiPath Technology Company

USA . 10 parts In-Stock

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$2.976

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10

$2.976

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AZTECH Wire

Italy . 518 parts In-Stock

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$11.550

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518

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Metaverse IC Inc.

Canada . 50,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 27,896 parts In-Stock

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Perfect Parts

USA . 9,460 parts In-Stock

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Corphita

USA . 3,517 parts In-Stock

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Kepictronics

USA . 2,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 1,913 parts In-Stock

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Parana Technologies

USA . 390 parts In-Stock

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$1.892

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Overview

Unlock superior performance with the STL60N32N3LL from STMicroelectronics, a leader in cutting-edge semiconductor solutions. This powerful N-channel MOSFET ensures efficient switching for your high-demand applications while delivering remarkable reliability and minimal energy loss. Designed for enhanced thermal management, it excels in automotive, industrial, and consumer electronics. Experience the perfect blend of quality, innovation, and value that empowers your projects to reach new heights.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body ensures durability and resistance to environmental factors, making this FET suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors offer lower on-resistance and higher efficiency, making them ideal for power management solutions.

Configuration: SERIES, 2 ELEMENTS

The series configuration allows increased voltage and current handling capabilities, enhancing its utility in complex circuits.

Transistor Application: SWITCHING

Designed for switching applications, this FET can efficiently control and manage power flow, reducing losses in circuits.

Surface Mount: YES

As a surface mount device, it offers flexibility in PCB design and allows for automated assembly, reducing production costs.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30 V provides a robust operational range, helping to safeguard circuits against voltage spikes.

Package Shape: RECTANGULAR

The rectangular package shape facilitates better space utilization on PCBs, making it ideal for compact designs.

Terminal Form: NO LEAD

No lead design minimizes the footprint and enhances the thermal performance, contributing to improved efficiency.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for greater control over the transistor, enhancing performance in specific applications.

No. of Elements: 2

Having 2 elements allows for greater functional versatility, enabling complex configurations in power circuits.

Maximum Pulsed Drain Current (IDM): 48 A

The high pulsed drain current capability of 48 A allows for efficient handling of transient loads, making it suitable for demanding applications.

Maximum Drain Current (Abs) (ID): 60 A

With an absolute maximum drain current of 60 A, this FET can handle significant loads, ensuring reliable performance.

No. of Terminals: 4

Four terminals provide easy integration into various circuit designs, allowing for greater flexibility and functionality.

Maximum Power Dissipation (Abs): 50 W

The ability to dissipate up to 50 W ensures that the transistor can operate efficiently without overheating in high-power applications.

Package Style (Meter): SMALL OUTLINE

The small outline package saves space on PCBs while maintaining performance, appealing to modern compact electronic device designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for lower power consumption and high-speed operation, enhancing the overall efficiency of systems.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C ensures reliable performance in high-temperature environments, extending its usability.

Transistor Element Material: SILICON

Silicon as the element material provides excellent electrical characteristics, supporting a wide array of electronic applications.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish enhances solderability and provides excellent corrosion resistance, ensuring long-term reliability.

Maximum Drain Current (ID): 32 A

The 32 A rating for maximum drain current supports high current applications, ensuring robust performance in demanding scenarios.

Maximum Drain-Source On Resistance: 0.12 ohm

A low on-resistance of 0.12 ohm minimizes conduction losses, making this FET an efficient choice for power applications.

Terminal Position: DUAL

Dual terminal positioning simplifies layout design on PCBs, promoting better thermal management and connectivity.

Moisture Sensitivity Level (MSL): 3

An MSL of 3 indicates the product's reliability and stability during manufacturing processes, safeguarding against moisture-related issues.

Case Connection: DRAIN

DRAIN case connection optimizes the performance in power management applications by ensuring efficient current flow.

Maximum Time At Peak Reflow Temperature (s): 30

A maximum peak reflow time of 30 seconds allows for efficient soldering processes, enhancing manufacturing efficiency.

Peak Reflow Temperature °C: 260

The ability to withstand peak reflow temperatures up to 260 °C ensures compatibility with standard soldering processes, enhancing manufacturability.

Technical Specifications

Power Field Effect Transistors (FET) STL60N32N3LL attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

DRAIN

Configuration:

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

32 A

Maximum Drain-Source On Resistance:

.12 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-N4

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

2

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

48 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STL60N32N3LL Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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