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STL6NK55Z

STMicroelectronics

STL6NK55Z by STMicroelectronics

STL6NK55Z by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 550V breakdown voltage, 3.44A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in compact electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,844 parts In-Stock

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4,844

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Anansix

USA . 2,899 parts In-Stock

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2,899

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Vyrian

USA . 1,493 parts In-Stock

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1,493

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,515 parts In-Stock

1+ parts

$1.351

100+ parts

-

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$1.216

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1,515

$1.351

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$1.216

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MKK Technologies

India . 33 parts In-Stock

1+ parts

$2.541

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33

$2.541

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DigiPath Technology Company

USA . 33 parts In-Stock

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$2.541

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33

$2.541

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Corphita

USA . 4,883 parts In-Stock

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4,883

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A-Z Elektronik GmbH

Germany . 4,518 parts In-Stock

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4,518

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Parana Technologies

USA . 1,485 parts In-Stock

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$1.616

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1,485

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$1.616

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Metaverse IC Inc.

Canada . 197 parts In-Stock

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197

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Overview

Unlock the power of innovation with the STL6NK55Z from STMicroelectronics, a leader in high-quality semiconductor solutions. This N-channel Power FET is designed for efficiency and reliability, making it ideal for cutting-edge applications in automotive and industrial sectors. With superior switching capabilities and robust performance, you can trust this component to enhance your designs while improving energy savings and overall system durability. Elevate your projects with ST's commitment to excellence!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs are widely favored in high-speed switching and amplification applications due to their superior electron mobility, making this FET ideal for efficient switching.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances reliability by providing protection against reverse current, which is essential in power management applications.

Transistor Application: SWITCHING

Optimized for switching applications, this FET offers fast response times, making it ideal for use in power amplifiers and digital circuits.

Surface Mount: YES

Being surface mountable allows for compact design and easy integration into modern circuit boards, enhancing design flexibility.

Minimum DS Breakdown Voltage: 550 V

With a high breakdown voltage, this FET can be used in high-voltage applications, ensuring reliability and performance under demanding conditions.

Package Shape: SQUARE

The square package shape facilitates efficient space utilization on PCBs, contributing to compact and organized designs.

Terminal Form: NO LEAD

No lead terminals mean a better surface mount performance, reducing the risk of mechanical stress and ensuring a reliable connection.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation ensures low on-resistance and reduced power loss, making it suitable for efficient power management.

Maximum Pulsed Drain Current (IDM): 3.44 A

The high pulsed drain current allows for robust performance in pulsing applications, making this FET versatile for various circuit designs.

Avalanche Energy Rating (EAS): 160 mJ

A high avalanche energy rating signifies a strong tolerance to transient events, ensuring reliability and stability in varied operating conditions.

Maximum Drain Current (Abs) (ID): 0.86 A

While not the highest maximum drain current, 0.86 A is sufficient for many applications, offering a balance between size and performance.

No. of Terminals: 5

Five terminals allow for versatile configurations and designs, supporting various circuit layouts.

Maximum Power Dissipation (Abs): 75 W

A high power dissipation rating enables this FET to handle significant amounts of power without overheating, ensuring operational safety.

Package Style (Meter): CHIP CARRIER

Chip carrier packages offer enhanced thermal performance and electrical characteristics, which are vital in power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology allows for enhanced switching speeds and lower power consumption, making this device highly efficient.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature allows for use in high-temperature environments, making it suitable for demanding applications.

Transistor Element Material: SILICON

Silicon-based FETs are standard due to their excellent electrical characteristics and thermal stability, ensuring reliable performance.

Maximum Drain Current (ID): 0.86 A

Reiterated value demonstrating reliability and consistency in performance for a variety of electronic applications.

Maximum Drain-Source On Resistance: 1.4 ohm

A low on-resistance value enables higher efficiency and less power loss during operation, making this FET an excellent choice for power switching.

Terminal Position: QUAD

Quad terminal positions enhance circuit design flexibility and facilitate layout adjustments for improved performance.

Moisture Sensitivity Level (MSL): 3

An MSL of 3 indicates a reasonable level of moisture sensitivity, requiring standard handling precautions, which is manageable in typical manufacturing environments.

Case Connection: DRAIN

Direct connection to the drain improves thermal management and dissipation, ensuring stable operation throughout the device's lifespan.

Technical Specifications

Power Field Effect Transistors (FET) STL6NK55Z attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

160 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

550 V

Maximum Drain Current (Abs) (ID):

.86 A

Maximum Drain Current (ID):

.86 A

Maximum Drain-Source On Resistance:

1.4 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

S-XQCC-N5

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

5

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

SQUARE

Package Style (Meter):

CHIP CARRIER

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

3.44 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

NO LEAD

Terminal Position:

QUAD

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STL6NK55Z Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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