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STL60NH3LL

STMicroelectronics

STL60NH3LL by STMicroelectronics

STL60NH3LL by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 30 A, a breakdown voltage of 30 V, and operates at up to 150 °C. Ideal for compact power management in surface mount designs.

Median Price

$0.921

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (In-Stock)

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Lakeland Logistics Inc

USA . 24,000 parts In-Stock

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Vyrian

USA . 3,606 parts In-Stock

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Bristol Electronics

USA . 3,000 parts In-Stock

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$0.921

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$0.811

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3,000

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$0.921

$0.811

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Anansix

USA . 1,245 parts In-Stock

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Digiode

USA . 124 parts In-Stock

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Prism Electronics

USA . 24 parts In-Stock

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IDEA Electronic Components Group

UK . 226 parts In-Stock

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$0.719

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$0.647

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226

$0.719

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$0.647

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MKK Technologies

India . 1,218 parts In-Stock

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$1.353

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DigiPath Technology Company

USA . 1,218 parts In-Stock

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$1.353

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AZTECH Wire

Italy . 302 parts In-Stock

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$21.250

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Perfect Parts

USA . 19,906 parts In-Stock

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Kepictronics

USA . 9,902 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,717 parts In-Stock

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A-Z Elektronik GmbH

Germany . 1,886 parts In-Stock

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Corphita

USA . 1,173 parts In-Stock

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Parana Technologies

USA . 950 parts In-Stock

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$0.860

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950

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$0.860

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Overview

Unlock unparalleled efficiency with the STL60NH3LL from STMicroelectronics, a leader in innovative semiconductor solutions. This N-channel Power FET is designed for seamless switching applications, delivering outstanding performance and reliability for your projects. Its compact surface-mount design and built-in diode enhance versatility, making it ideal for automotive, industrial, and consumer electronics. Experience superior power management that drives your success!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have lower on-resistance and higher electron mobility, enhancing efficiency in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional protection and simplifies design by reducing the number of components needed.

Transistor Application: SWITCHING

Optimized for switching applications, this FET is suitable for a wide range of electronic circuits and power management.

Surface Mount: YES

Surface mount technology allows for compact designs and improved thermal management, making it ideal for modern circuit designs.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30 V ensures reliability in high-voltage applications without risk of failure.

Package Shape: RECTANGULAR

The rectangular shape is designed for efficient space utilization on printed circuit boards (PCBs).

Terminal Form: NO LEAD

No-lead terminals reduce inductance and improve switching performance while providing a smaller footprint.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for lower power consumption when off and higher efficiency when on, making it ideal for battery-powered applications.

Maximum Pulsed Drain Current (IDM): 64 A

A high pulsed drain current capacity supports demanding applications such as motor drives and power supply switching.

Avalanche Energy Rating (EAS): 150 mJ

A robust avalanche energy rating enhances reliability in transient conditions, providing extra protection during operation.

Maximum Drain Current (Abs) (ID): 30 A

With a maximum absolute drain current of 30 A, this FET can handle substantial loads, making it versatile for various applications.

No. of Terminals: 5

Having 5 terminals allows for flexible circuit design and configuration, accommodating various circuit topologies.

Maximum Power Dissipation (Abs): 60 W

A power dissipation capability of 60 W indicates efficient thermal management, which is critical in high-performance applications.

Package Style (Meter): SMALL OUTLINE

The small outline package facilitates fitting into compact designs, crucial for space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology enables high-speed operation and low on-resistance for better overall performance.

Maximum Operating Temperature: 150 °C

A high operating temperature rating ensures stable performance in harsh environments and enhances reliability.

Transistor Element Material: SILICON

Silicon is a widely used material for FETs, known for its excellent electrical characteristics and durability.

Terminal Finish: MATTE TIN

The matte tin finish provides excellent solderability and corrosion resistance, ensuring long-term reliability.

Maximum Drain Current (ID): 16 A

A reliable drain current rating of 16 A ensures that the device can efficiently handle typical load conditions.

Maximum Drain-Source On Resistance: 0.0105 ohm

A low on-resistance minimizes power loss during operation, making it more energy-efficient and cost-effective.

Terminal Position: DUAL

Dual terminal positions enhance the flexibility and ease of layout on PCBs, facilitating better design options.

Moisture Sensitivity Level (MSL): 3

An MSL of 3 indicates adequate protection against moisture, ideal for standard manufacturing and assembly processes.

Case Connection: DRAIN

The drainage case connection allows for effective heat dissipation, promoting optimal thermal management.

Technical Specifications

Power Field Effect Transistors (FET) STL60NH3LL attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Avalanche Energy Rating (EAS):

150 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

30 A

Maximum Drain Current (ID):

16 A

Maximum Drain-Source On Resistance:

.0105 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-N5

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

5

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

64 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STL60NH3LL Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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