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STD90NH02LT4

STMicroelectronics

STD90NH02LT4 by STMicroelectronics

STD90NH02LT4 by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 60 A, a breakdown voltage of 24 V, and operates at up to 175 °C. Ideal for power management in compact electronic devices.

Median Price

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Lifecycle Status

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8

In-Stock Inventory

1k+

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R&J Components

USA . 104,947 parts In-Stock

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Cyclops Electronics Ltd

UK . 6,435 parts In-Stock

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6,435

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Vyrian

USA . 3,609 parts In-Stock

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3,609

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Anansix

USA . 2,504 parts In-Stock

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Bristol Electronics

USA . 2,500 parts In-Stock

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2,500

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Prism Electronics

USA . 1,800 parts In-Stock

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Digiode

USA . 470 parts In-Stock

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470

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Speed Components Ltd

Israel . 124 parts In-Stock

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IDEA Electronic Components Group

UK . 194 parts In-Stock

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$1.008

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$0.907

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194

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$0.907

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MKK Technologies

India . 559 parts In-Stock

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$1.896

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DigiPath Technology Company

USA . 559 parts In-Stock

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$1.896

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559

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AZTECH Wire

Italy . 854 parts In-Stock

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$13.460

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854

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Perfect Parts

USA . 66,416 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 7,428 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,246 parts In-Stock

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Authorized Procurement Solutions

USA . 2,500 parts In-Stock

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Corphita

USA . 1,424 parts In-Stock

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Parana Technologies

USA . 218 parts In-Stock

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$1.206

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Overview

Elevate your projects with the STD90NH02LT4 from STMicroelectronics, a leader in innovation and quality. This powerful N-Channel FET ensures efficient switching capabilities for a range of applications, from automotive to industrial systems. Its robust design offers impressive performance with minimal energy loss, making it a reliable choice for demanding environments. Trust in STMicroelectronics to deliver unparalleled value and reliability that enhances your designs and drives success.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body ensures durability and reliability, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high efficiency and good switching performance, making this product ideal for power management tasks.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances protection against reverse voltage and simplifies circuit design, providing added convenience.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers efficient performance in on/off control conditions.

Surface Mount: YES

Surface mount technology allows for compact PCB design and automated assembly, improving production efficiency.

Minimum DS Breakdown Voltage: 24 V

A minimum breakdown voltage of 24 V allows this FET to operate safely in applications with higher voltage requirements.

Package Shape: RECTANGULAR

The rectangular package shape is conducive to efficient space utilization on PCBs, optimizing layout design.

Terminal Form: GULL WING

Gull wing terminals are easy to solder, providing reliable connections even in high-density applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for greater control and flexibility in circuit design, particularly in switching applications.

Maximum Pulsed Drain Current (IDM): 240 A

The high pulsed drain current capability means this FET can handle short bursts of high power, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 600 mJ

A high avalanche energy rating provides protection against high-energy transients, ensuring reliability in harsh conditions.

Maximum Drain Current (Abs) (ID): 60 A

With a maximum drain current of 60 A, this FET is suitable for high-current applications, enabling effective power switching.

No. of Terminals: 2

The simple two-terminal design minimizes complexity, making integration into circuits straightforward.

Maximum Power Dissipation (Abs): 95 W

A maximum power dissipation of 95 W indicates high thermal handling capabilities, which is essential for reliability in power applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style allows for compact designs, enabling engineers to save space on crowded PCBs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology benefits from fast switching speeds and low on-resistance, making it suitable for high-frequency applications.

Maximum Operating Temperature: 175 °C

The capability to operate at high temperatures ensures that this FET can function reliably in demanding environments.

Transistor Element Material: SILICON

Silicon is a well-established material for FETs, offering good performance and availability, thus ensuring reliability.

Terminal Finish: MATTE TIN

Matte tin terminal finish provides excellent solderability and corrosion resistance, enhancing long-term reliability.

Maximum Drain Current (ID): 60 A

Reiterating the high current capability, this feature makes the FET excellent for applications requiring substantial current management.

Maximum Drain-Source On Resistance: 0.006 ohm

Very low on-resistance reduces power loss and improves efficiency during operation, making this FET an excellent choice for power applications.

Terminal Position: SINGLE

Having a single terminal position simplifies layout and design, which can lead to cost-effective manufacturing.

Case Connection: DRAIN

With the case connected to the drain, thermal management can be optimized, supporting effective heat dissipation for high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) STD90NH02LT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Avalanche Energy Rating (EAS):

600 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.006 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD90NH02LT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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