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STD95NH02L-1

STMicroelectronics

STD95NH02L-1 by STMicroelectronics

STD95NH02L-1 from STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 80 A, a breakdown voltage of 24 V, and operates at up to 175 °C. Ideal for high-power circuits, it ensures reliable performance with low on-resistance.

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4

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1k+

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Vyrian

USA . 3,152 parts In-Stock

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Digiode

USA . 349 parts In-Stock

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Anansix

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Prism Electronics

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IDEA Electronic Components Group

UK . 782 parts In-Stock

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$0.389

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$0.350

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MKK Technologies

India . 1,170 parts In-Stock

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$0.732

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DigiPath Technology Company

USA . 1,170 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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Authorized Procurement Solutions

USA . 7,500 parts In-Stock

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Corphita

USA . 4,047 parts In-Stock

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Parana Technologies

USA . 307 parts In-Stock

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Perfect Parts

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Overview

Unlock the potential of your designs with the STD95NH02L-1 from STMicroelectronics, a powerhouse in reliable power transistors. Crafted for excellence, this N-channel FET is perfect for high-efficiency switching applications, delivering impressive performance under demanding conditions. Enjoy enhanced reliability and robust thermal management, ensuring your systems run smoothly. Choose STMicroelectronics for a legacy of quality and innovation that empowers your projects to thrive!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy materials provides durability and resistance to environmental factors, making the product reliable in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs offer lower on-resistance and better efficiency compared to P-channel types, making them ideal for high-performance switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies design by eliminating the need for an external protection diode, enhancing space efficiency in circuits.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET ensures fast operation and high reliability in power management systems.

Minimum DS Breakdown Voltage: 24 V

The minimum breakdown voltage of 24 V provides a robust safety margin for various power applications and protects the device from over-voltage conditions.

Package Shape: RECTANGULAR

The rectangular package shape allows for compact layouts on circuit boards, facilitating space-efficient designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide mechanical strength and good electrical connections, ideal for high-power applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation offers better control and lower power losses compared to depletion mode, improving efficiency in performance.

Maximum Pulsed Drain Current (IDM): 320 A

A high pulsed drain current capability of 320 A ensures this FET can handle substantial current surges, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 600 mJ

The avalanche energy rating of 600 mJ allows this transistor to withstand energy surges without failure, providing reliability in transient conditions.

Maximum Drain Current (Abs) (ID): 80 A

With a maximum drain current of 80 A, this FET can efficiently manage high currents, supporting various power-intensive applications.

No. of Terminals: 3

Three terminals ensure straightforward integration and minimal complexity in circuit design, enhancing usability.

Maximum Power Dissipation (Abs): 100 W

High power dissipation of 100 W allows this FET to operate effectively in high-power environments, ensuring longevity and consistent performance.

Package Style (Meter): IN-LINE

The in-line package style enables effective cooling and integration into densely populated circuit boards.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology enables fast switching speeds and low conduction losses, which are crucial for energy efficiency in modern electronic devices.

Maximum Operating Temperature: 175 °C

A maximum operating temperature of 175 °C enhances reliability in harsh environments, expanding the range of applications.

Transistor Element Material: SILICON

The silicon material provides excellent electrical characteristics and heat tolerance, enhancing performance and durability.

Terminal Finish: MATTE TIN

Matte tin terminal finish enhances corrosion resistance and solderability, ensuring robust and reliable connections.

Maximum Drain Current (ID): 80 A

The ability to handle a consistent drain current of 80 A ensures dependable performance in high-load situations.

Maximum Drain-Source On Resistance: 0.009 ohm

Ultra-low on-resistance of 0.009 ohms minimizes power losses during operation, ensuring high efficiency in switching applications.

Terminal Position: SINGLE

A single terminal position simplifies circuit integration and layout, promoting straightforward design application.

Case Connection: DRAIN

DRAIN case connection ensures optimized thermal management and efficient current flow, crucial for high-performance applications.

Maximum Time At Peak Reflow Temperature (s): 30

A peak reflow time of 30 seconds ensures proper soldering during assembly, enhancing reliability and performance of the product in use.

Peak Reflow Temperature °C: 260

The ability to withstand a peak reflow temperature of 260 °C ensures compatibility with high-temperature soldering processes in manufacturing.

Technical Specifications

Power Field Effect Transistors (FET) STD95NH02L-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Avalanche Energy Rating (EAS):

600 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.009 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

320 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD95NH02L-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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